Question

Make a plot of built-in voltage on the y-axis and log (aoping concentration from 1010-1020/cm2) on the x- axis for symmetrical pn junctions (NA = No). Do not just sketch the curve plot it. Make a plot of depletion width on the y-axis and log (doping concentration from 1010-1020/cm3) on the x axis for symmetrical pn junctions. Again plot dont sketch. Be sure to use enough data points to give an accurate doping level for when the curve is a maximum Discuss the two plots

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Answer #1

Given that:- Make a plot of bailt-in voltage on the Y-axis and log (doping Concentration from 10.1038/(m3) on the x-axis for

The matlab code is developed to plot the graph withVbi vs Na or Nd

%Vbi Computation (Na=Nd symmetric device)
clear all;
clc;
%Constants
EG=1.12;
kT=0.0259;
ni=1.0e10;

%Computation
ND=logspace(10,20);
Vbi=2*kT.*log(ND./ni);

%Plotting
close
semilogx(ND,Vbi); grid
axis([1.0e10 1.0e20 0.05 1.2])
xlabel('NA or ND (cm-3)'); ylabel('Vbi (volts)')
title('Plot of Vbi vs NA or ND');

plooted graph:

Plot of Vbi vs NA or ND Vbi (volts) 0,15 1010) பட்டப் பட்டப் பட்டப்பட்டவர் பபபபபபபபபபபாடடபபபபபபபபபபபா 1011 1012 1013 1014 1012.) The written deplation width vs doping Concentration is as, - Na tnd I - Nard , vbi If Nai Nd, then the equation becomes W

Matlabcode:

%Constants and Parameters
T=300; % Temperature in Kelvin
k=8.617e-5; % Boltzmann constant (eV/K)
e0=8.85e-14; % permittivity of free space (F/cm)
q=1.602e-19; % charge of an electron (coul)
KS=11.8; % dielectric constant of Si at 300K
ni=1e10; % intrinsic carrier conc. in Silicon at 300K (cm^-3)
EG=1.12; % band gap of Silicon (eV)

%Depletion width calculation
ND=logspace(10,20);
Vbi=2*kT.*log(ND./ni);

W=1.0e4*sqrt(2*KS*e0/q.*(Vbi)./ND);

%Plot
close
loglog(ND, W,'-')
axis([1.0e10 1.0e20 0.5e-2 2.0e1])
grid
xlabel('NA or ND (cm^-3)')
ylabel('W (micrometers)')
title('Plot of W vs NA or ND');

Plotted waveform:

Plot of W vs NA or ND 101 W (micrometers) 101010121014101610181020 NA or ND (cm 3)

. From the two figures, we can conclude that the built in potential is increased by increasing the doping Gantention. The wid

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