After spinning of photo resist over a wafer with prefabricated microstructures that introduce certain topology (i.e. non-flat surface) as shown bellow. Given the fact a g-line UV light exposure system with 257nm wavelength (i.e. λ=257nm).Based on your best scientific judgment (i.e. hand calculation with calculator), will the grating patterns in Region A come out after a standard photolithography? (Go ahead assume the rest of the photolithography steps are perfectly done) (15 Pts).How about the similar grating patterns in Region B? Will those patterns in Region B turn out to be good after standard photolithography process? (Please support your conclusion with calculations) (15 Pts)
After spinning of photo resist over a wafer with prefabricated microstructures that introduce certain topology (i.e....