Question

Show that low pressure chemical vapour deposition [low pressure combined with high gas velocity d...

Show that low pressure chemical vapour deposition [low pressure combined with high gas velocity due to pumping] results in surface reaction limited growth.

0 0
Add a comment Improve this question Transcribed image text
Answer #1

Low pressure chemical deposition uses the heat to initiate the reaction on solid substrate, low pressure is used to avoid any unwanted reaction, but continuous deposition cause local increase in concentration which eventually limits the reaction growth, this might be the disadvantage of this process.

Add a comment
Know the answer?
Add Answer to:
Show that low pressure chemical vapour deposition [low pressure combined with high gas velocity d...
Your Answer:

Post as a guest

Your Name:

What's your source?

Earn Coins

Coins can be redeemed for fabulous gifts.

Not the answer you're looking for? Ask your own homework help question. Our experts will answer your question WITHIN MINUTES for Free.
Similar Homework Help Questions
ADVERTISEMENT
Free Homework Help App
Download From Google Play
Scan Your Homework
to Get Instant Free Answers
Need Online Homework Help?
Ask a Question
Get Answers For Free
Most questions answered within 3 hours.
ADVERTISEMENT
ADVERTISEMENT
ADVERTISEMENT