Question

Problem 5: Design Anisotropic silicon etching is used to create an inverted pyramid to serve as a microliter fluid reservoir. The mask layer is silicon nitride. The anisotropic etchant is EDP Which of the following masks will yield the largest reservoir volume? Assume all the diagrams are drawn with same scale. <110> <110> <100> 110> 2. b and c 4. b and d 5. a and c 6. a, c and d

Answer 1

The Volume an be es tina tadl y sinple matenatica0 echniaer in (a), the side cf the sqyare is a . As the entire. Scan of a is 6. There-fore. sn a), the squave of-the.cuuton is a. tet us ersidex ini tialy before etchirg the voluna was no inelicatod e 11 Un a) the soware o So, in oxder to mate c volumo of lio, ue need aaxa-xa3. After etching-) a. erina Frorn b fremthe initiel voloma is loo al when camparedt to the votomo of C tuke the entire space of the outar sapeare and al circle forn.. Soin this case ,-let-the-inita a volume be too . Now азхазх аз--too-riniti ally]. Now after oe ching -the volune ut Portion cannot be a3 st is stiahty of Leaser voluma tan a3

すn case of e), as tee initiul Volume js ite,fe is slight greater-ter --㊤, Compau ct port uwupex tte langer vo ood mask (as most、of tee pats aura et ched OY t off canotbe a hanandyol fargest Yeservoir Vo tom