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Currently, photolithography using light of 157 nm wavelength is being developed. What feature size can be...

Currently, photolithography using light of 157 nm wavelength is being developed. What feature size can be achieved in this case? Which part of the electromagnetic spectrum is it?

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Answer #1

feature size below 50nm is possible in 157nm light source and it comes under ultraviolet region(10nm-400 nm) of electromagnetic spectrum

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