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P3. (a) Determine the position of the Fermi level with respect to the intrinsic Fermi level in silicon at T = 300K that is d
P1. For the Boltzmann approximation to be valid for a semiconductor, the Fermi level must be at least 3kT below the donor lev
P3. (a) Determine the position of the Fermi level with respect to the intrinsic Fermi level in silicon at T = 300'K that is doped with phosphors atoms at a concentration of 1015 cm. (b) Repeat (a) if the silicon is doped with boron atoms at a concentration of 10'5 cm3. (c) Calculate the electron concentration in the silicon for parts (a) and (b)
P1. For the Boltzmann approximation to be valid for a semiconductor, the Fermi level must be at least 3kT below the donor level (assume Ec) in an n-type material and at least 3kT above the acceptor level (assume Ev) in a p-type material. If T = 3002, determine the maximum electron concentration in an n-type semiconductor and the maximum hole concentration in a p-type semiconductor for the Boltzmann approximation to be valid in Silicon material
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Kbi 0:02610 22 v10 /rn uilibriun

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