The performance of a semiconductor depends upon the thickness of a layer of silicon dioxide. In an experiment (Czitrom and Reece, 1997), layer thicknesses were measured at three furnace locations for three types of wafers (virgin wafers, recycled in-house wafers, and recycled wafers from an external source). The data are contained in the file waferlayers. Conduct a two-way analysis of variance and test for significance of main effects and interactions. Construct a graph such as that shown in Figure 12.3. Does the comparison of layer thicknesses depend on furnace location?
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