In fabricating microelectronics circuits, a ceramic conductor such as is employed to connect various regions of a transistor with the outside world, notably aluminum wires. The is deposited as a thin film via chemical vapor deposition, in which are reacted at the Si surface. Write a balanced equation for the reaction, assuming that the other products are H2 and HCl. Why might behave better as a conducting interconnect on Si than on a metal such as Cu?
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