q = 1.6x10-19 C, n = 1.5 x 1010 cm, kT/q = 0.026 V, silicon permittivity...
n_3. The gate length Q2 Consider an n-type MOSFET with NA-7x 1012 cm of the MOSFET L=2 um, width W=12 /um and the oxide thickness tor= 8 nm. Take N-Ny=1019 cm-3, Eg=1.12 eV, n;=1.5x1010 cm' kT-0.026 eV, vacuum permittivity eo-8.854x1014 F/cm, dielectric con- stant of oxide eo=4, dielectric constant of silicon Esi=12, electron mobil- ity n230 cm2/Vs, hole mobility p83 cm2/Vs -3 Q2.1 Calculate qoB = |Ef- E4], the oxide capacitance Cor; the maximum depletion width Wmaa and the threshold...
Q2 MOSFET and I-V Curves (Total 30 pts) Q2.1 Consider the band diagrams (conduction band) of a N-MOSFET along the channel (x) direction as shown in fig. 1. In fig. 1, the solid curve shows the band diagram with the gate voltage VG = 0. All the variables have their usual meaning. Which of the dashed curves (case I or case II) in fig. 1 represents of the band diagram (conduction band) of the N-MOSFET with VG >0? 5 pts...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...