Question

(3 pt) For the following reactions:

a) Label the substrate (1°, 2°, 3°), reagent (Good/Poor Nu, Strong/Weak Base) and solvent (protic, aprotic).

b) Determine what mechanism will predominate (SN1, SN2, E1, or E2).

c) Draw the product(s) you would expect to form, paying attention to regioselectivity and stereoselectivity.

4. (3 pt) For the following reactions: a) Label the substrate (1º, 2º, 3º), reagent (Good/Poor Nu, Strong/Weak Base) and solv

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Answer #1

meoH Heat trone substrate is agent mechanism: Ipoor Nu en: TSNa Sna, solvent (protic) Вр BP, Sot NaOH I DMF substrate is : 20

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