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14 Q1. Given a NA = 10 /cm" doped Si sample a) b) c) Calculate Ef...
please show steps by step Note: In following problems use (if needed) B=1.08x1031K3.cm-6 for Si and...
please show steps by step
Note: In following problems use (if needed) B=1.08x1031K3.cm-6 for Si and B = 2.31x1030K3cm" for Ge. Eg (for Si): 1.12 eV, Eg (for Ge)-0.66 eV Boltzmann's constant = 8.62x10-5 eW0K 1.38044x10-23J/0K 1. Silicon is doped with 6x10 18 boron atoms/cm3 (a) Is this n or p type silicon? (b) What are the hole and electron concentrations at 200K? 2. Silicon is doped with a donor atoms of 4x10 16 atoms/cm3 (a) Find the electron and...
1. a. Find the main error in each of the band diagrams shown below. For all...
1. a. Find the main error in each of the band diagrams shown below. For all of the band diagrams Ny 1019/cm3, Ne- 1019/cm3, ni = 3 x 108/cm". E,-1.25 eV, T = 300 K. Ef Ef EFi Main error: Main error: Main error: Main error: Consider a semiconductor sample with the following characteristics: EG 1.25 eV, T 300 K, Nd 5 x 101*/cm3, Na 1014/cm3, N.-1019/cm3, N.-1019/cm3, ni-3 × 108/cm3. Assume complete ionization b. Find the equilibrium electron and...
Applied quantum mechanics 1. Calculate the carrier concentrations (p and n) for Si at 300k for...
Applied quantum mechanics
1. Calculate the carrier concentrations (p and n) for Si at
300k for the following doping concentrations:
2.
(a) ND = 1015/cm3
(b) NA = 1018/cm3
(c) ND = 5 x 1017/cm3
Calculate the majority and minority carriers for each side of
an N+P junction if ND = 2 x 1017/cm3 for the n-side, and NA =
1014/cm3 for the p-side.
Assume the semiconductor is Si and the temperature is
300K.
3. Determine the energy of:
(a)...
An IC circuit requires that we design a 50 n-type resistor in a p- type Si wafer. the acceptir do...
an IC circuit requires that we design a 50 n-type
resistor in a p- type Si wafer. the acceptir doping is 1014/cm3,
the donor implant depth is 5 micro met, the lenght of the registor
is 20 micromet, and the maximum width allowed is 15 micromet.
caculate the required donor density. assume that 1000cm2/Vs
300cm2/Vs
Note c 3x10m/s, h-6.63x10 J-s, mo-9.11x10 kg, q-1.6x 10-19 C, nis-1.5x10/cm3. Eo-8.85x10-12 F/m, Erst 11.8, k-1.38x1023 J/K, Ers1o2-3.9, T-300K, 1 eV-1.6x10-19 J I. An IC...
EENG 245 Physical electronics HW 1 1) The NaCl crystal is cubic, and can be described...
EENG 245 Physical electronics HW 1 1) The NaCl crystal is cubic, and can be described as follows. Na atoms sit at the corners and faces of a cube, and Cl atoms sit in between two Na atoms. This means that a Clatom is found half-way along each of the cube edges, and there is a Cl in the center of the cube. (We could also have described the lattice by interchanging Na and Cl in the description above.) Another...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...
Please help me out.. Need to pass this course as a removal for my other course.....
Please help me out.. Need to pass this course as a removal for
my other course..
Si material parameters: Band gap energy at 300 K: Eg = 1.124 eV Relative permittivity: x = 11.7 Effective mass of electron: m =1.08m for density of states, Effective mass of hole: m = 0.81m for density of states, m = 0.26m for conductivity m =0.39m for conductivity Up = 470 cm/V.s Mobility: Un = 1400 cm /V-s, Diffusion coefficient: Do = 36 cm²/s,...
please show steps by step
Note: In following problems use (if needed) B=1.08x1031K3.cm-6 for Si and B = 2.31x1030K3cm" for Ge. Eg (for Si): 1.12 eV, Eg (for Ge)-0.66 eV Boltzmann's constant = 8.62x10-5 eW0K 1.38044x10-23J/0K 1. Silicon is doped with 6x10 18 boron atoms/cm3 (a) Is this n or p type silicon? (b) What are the hole and electron concentrations at 200K? 2. Silicon is doped with a donor atoms of 4x10 16 atoms/cm3 (a) Find the electron and...
1. a. Find the main error in each of the band diagrams shown below. For all of the band diagrams Ny 1019/cm3, Ne- 1019/cm3, ni = 3 x 108/cm". E,-1.25 eV, T = 300 K. Ef Ef EFi Main error: Main error: Main error: Main error: Consider a semiconductor sample with the following characteristics: EG 1.25 eV, T 300 K, Nd 5 x 101*/cm3, Na 1014/cm3, N.-1019/cm3, N.-1019/cm3, ni-3 × 108/cm3. Assume complete ionization b. Find the equilibrium electron and...
Applied quantum mechanics
1. Calculate the carrier concentrations (p and n) for Si at
300k for the following doping concentrations:
2.
(a) ND = 1015/cm3
(b) NA = 1018/cm3
(c) ND = 5 x 1017/cm3
Calculate the majority and minority carriers for each side of
an N+P junction if ND = 2 x 1017/cm3 for the n-side, and NA =
1014/cm3 for the p-side.
Assume the semiconductor is Si and the temperature is
300K.
3. Determine the energy of:
(a)...
an IC circuit requires that we design a 50 n-type
resistor in a p- type Si wafer. the acceptir doping is 1014/cm3,
the donor implant depth is 5 micro met, the lenght of the registor
is 20 micromet, and the maximum width allowed is 15 micromet.
caculate the required donor density. assume that 1000cm2/Vs
300cm2/Vs
Note c 3x10m/s, h-6.63x10 J-s, mo-9.11x10 kg, q-1.6x 10-19 C, nis-1.5x10/cm3. Eo-8.85x10-12 F/m, Erst 11.8, k-1.38x1023 J/K, Ers1o2-3.9, T-300K, 1 eV-1.6x10-19 J I. An IC...
EENG 245 Physical electronics HW 1 1) The NaCl crystal is cubic, and can be described as follows. Na atoms sit at the corners and faces of a cube, and Cl atoms sit in between two Na atoms. This means that a Clatom is found half-way along each of the cube edges, and there is a Cl in the center of the cube. (We could also have described the lattice by interchanging Na and Cl in the description above.) Another...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...
Please help me out.. Need to pass this course as a removal for
my other course..
Si material parameters: Band gap energy at 300 K: Eg = 1.124 eV Relative permittivity: x = 11.7 Effective mass of electron: m =1.08m for density of states, Effective mass of hole: m = 0.81m for density of states, m = 0.26m for conductivity m =0.39m for conductivity Up = 470 cm/V.s Mobility: Un = 1400 cm /V-s, Diffusion coefficient: Do = 36 cm²/s,...
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