an IC circuit requires that we design a 50 n-type
resistor in a p- type Si wafer. the acceptir doping is 1014/cm3,
the donor implant depth is 5 micro met, the lenght of the registor
is 20 micromet, and the maximum width allowed is 15 micromet.
caculate the required donor density. assume that 1000cm2/Vs
300cm2/Vs
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An IC circuit requires that we design a 50 n-type resistor in a p- type Si wafer. the acceptir do...
A p-type Si wafer is doped with Na-1e15/cmA3, find the level of donor doping we need...
A p-type Si wafer is doped with Na-1e15/cmA3, find the level of donor doping we need to convert the wafer from p-type to n-type, with a target electron density n = 1e16/cm^3. ni = 1e10/cm^3 O 9e15/cmA3 O 1.1e16/cm 3 O 1e16/cm 3
14 Q1. Given a NA = 10 /cm" doped Si sample a) b) c) Calculate Ef...
14 Q1. Given a NA = 10 /cm" doped Si sample a) b) c) Calculate Ef as a function of Temperature T at 500K intervals from 3000K to 5000K. Any conclusion could be drawn from a) part? If the donor has ND-1014/cm3 to replace the NA, what is the Ef at 3000K, 4000K and 5000K The band gap affected by temperature should be included. Q2. At 300K, please find the doping limit of both n-type and p-type Ge to have...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl =...
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl = 1.5 x 1010 cm3 Co [Farads] 3.45x1011 >Va [Volts] 1.0 0.3 (a) Is the semiconductor (silicon) substrate doped n-type or p-type? Explain briefly. (b) Is the measurement frequency low or high? Explain briefly. (c) What is the thickness of the gate oxide (SiO2), xo? (d) Estimate the...
A p-type Si wafer is doped with Na-1e15/cmA3, find the level of donor doping we need to convert the wafer from p-type to n-type, with a target electron density n = 1e16/cm^3. ni = 1e10/cm^3 O 9e15/cmA3 O 1.1e16/cm 3 O 1e16/cm 3
14 Q1. Given a NA = 10 /cm" doped Si sample a) b) c) Calculate Ef as a function of Temperature T at 500K intervals from 3000K to 5000K. Any conclusion could be drawn from a) part? If the donor has ND-1014/cm3 to replace the NA, what is the Ef at 3000K, 4000K and 5000K The band gap affected by temperature should be included. Q2. At 300K, please find the doping limit of both n-type and p-type Ge to have...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl = 1.5 x 1010 cm3 Co [Farads] 3.45x1011 >Va [Volts] 1.0 0.3 (a) Is the semiconductor (silicon) substrate doped n-type or p-type? Explain briefly. (b) Is the measurement frequency low or high? Explain briefly. (c) What is the thickness of the gate oxide (SiO2), xo? (d) Estimate the...
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