Summary - it is basic problem so I have shown step by step solution
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl =...
Problem l: The capacitance vs. gate voltage characteristic of a simple MOS capacitor of area 100 μιηχ 1 00pm is as shown: Assume Esi-1 1.9, Eox-3.9, Eo-8.85 >< 10-14 F/cm, and ni-1.5x 1010cm3 C (pF) 70 ECV) 0.25 a) What is the thickness of the gate oxide (Sio2)? b) Does the capacitor have a metal gate or poly-Si gate? Why? c) Is the substrate n-type or p-type? How do you know? d) Estimate the values of VFB and VrH. e)...
Problem 3: Consider a MOS capacitor maintained at T= 300K with the following characteristics: Assume s 11.9, ox 3.9, 8.85x 10-1 F/cm, and n 1.5 x 1010cm3 Gate material is n poly-silicon Total negative oxide charge of 5x 1011q C/cm . Substrate is n-type Si, with doping concentration 1 x1016 cm-3 Oxide thickness 5 nmm The electron affinity for Si is 4.03eV? e) What is the flat capacitance? f) What is the depletion region width? g) What is the potential...
Problem3: Consider a MOS capacitor maintained at T 300K with the following characteristics: Assume Esi 1.9,x 3.9,8.85 x 10-14 F/cm, and n 1.5 x 1010cm3 . Gate material is n+ poly-silicon . Total negative oxide charge of 5x 1011q C/cnm2 . Substrate is n-type Si, with doping concentration 1x1016 cm3 Oxide thickness 5 nm . The electron affinity for Si is 4.03eV? a) Draw the band diagram at equilibrium. b) From part (a). What is the substrate (bulk) condition at...