question 3 1. A photoconductor is made of n-type silicon with conductivity of 3 Scm1 and...
Qno2 only
lal Tario Test 2, ENS345, Spring 2019 r is made of n-type silicon with conductivity of 3 Scm2 and recombination 1. A photoconducto e of 50 us. When illuminated with light, the conductivity of the photoconductor increases to 5 Scm1. Find the electron-hole pairs recombination rate during illumination. 2. For the photoconductor described above, find enerey difference between quasi-Fermi levels before illumination and during illumination 3. For the photoconductor described above, estimate mean free time, mean fr magnitude...
pls do ques 1 and 2
1. A photoresistor is made of p-type silicon with resistivity of 0.2 Qcm and recombination lifetime of 200 μ. when illuminated with light, the resistivity of the photoresistor decreases down to 0.05 0cm. Find the electron-hole pairs generation rate during illumination. 2. In the photoresistor described above, find position of quasi-Fermi levels before illumination and during illumination. 3. In the resistor described above, estimate mean free time, mean free path and drift velocities of...
1. A photoresistor is made of p-type silicon with resistivity of 0.2 0cm and recombination lifetime of 200 us. When illuminated with light, the resistivity of the photoresistor decreases down to 0.OS Qcm Find the electron-hole pairs generation rate during illumination. 2. In the photoresistor described above, find position of quasi-Fermi levels before illumination and during illumination. 3. In the resistor described above, estimate mean free time, mean free path and drift velocities of electrons and holes when an electric...
pls
do ques 4 and 5
1. A photoresistor is made of p-type silicon with resistivity of o.2 0cm and recombination lifetime of 200 us. When illuminated with light, the resistivity of t Find the electron-hole pairs generation rate during illumination. he photoresistor decreases down to 0.05 Ocm 2. In the photoresistor described above, find position of quasi-Fermi levels before illumination and during illumination. 3. In the resistor described above, estimate mean free time, mean free path and drift electrons...
Qno 2 only
Test 2, ENS345, Spring 2019 1. A photoresistor is made of in-type silicon with resistivity of 10 Qcm and recombination lifetime of 30 ps. The photoresistor is illuminated with light so that the electron-hole pairs generation throughout its volume is resistivity of the photoresistor under illumination 2. In the photoresistor described above, find position of quasi-Fermi levels before illumination and during illumination. 3. In the resistor described above, estimate mean free time, mean free path and drift...
Qno 5 only
Test 2, ENS345, Spring 2019 is made of ntype silicon with resistivity of 10 am and recombination lifetime of 80 με. The photoresistor is illuminated with light so that the electron-hole pairs generation throughout its volume is resistivity of the photoresistor under illumination. 2. In the photoresistor described above, find position of quasi-Fermi levels before illumination and during illumination described above, estimate mean free time, mean free path and drift velocities of electrons and holes when 3....
1 A photoresistor is made of p-type silicon with resistivity of 0.2 0cm and recombination lifetime of 200 μ. When illuminated with light, the resistivity of the photoresistor decreases down to 0.05 gcm Find the electron-hole pairs generation rate during illumination.
1 A photoresistor is made of p-type silicon with resistivity of 0.2 0cm and recombination lifetime of 200 μ. When illuminated with light, the resistivity of the photoresistor decreases down to 0.05 gcm Find the electron-hole pairs generation rate...
a photoresistor is made of n-type silicon with a resistivity of 10ohm cm and recombination lifetime of 80 us. the photoresistor is illuminated with light so that the electron-hole pairs generation throughout its volume is 10 20/s.cm1. find resistivity of the photoresistor under illumination. please with details!
Si sample doped with donors 101°cm-3 initially at room temperature 300 °K (n 31010 cm. Later it is excited optically as such 1019 cm-3electron-hole pairs are produced in one second uniformly in the sample. Si band gap energy isEg-1.11 eV and the recombination for hole electron life-time10 μs. Hint may use results of question 1 above. Draw appropriate figures and mark related levels! a) Calculate the equilibrium Fermi level with respect to conduction band edge Ec b) Calculate the equilibrium...
Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped.
Silicon at at T-300 K...