and Lab Exer n this experiment you will evaluate effect of UV light on bacterial growth. UV light affects growth by interfering with DNA, resulting in thymine dimer formation. The dimerization...
and Lab Exer n this experiment you will evaluate effect of UV light on bacterial growth. UV light affects growth by interfering with DNA, resulting in thymine dimer formation. The dimerization is confined within adjacent thymine residues on same strand (intrastrand ). These dimmer lesions have consequence on DNA functions including interference in DNA replication, transcription etc, so UV exposure of cells can lead to lethal effects for bacterial multiplications. This forms the basis for UV method to control bacterial growth. 2 common mechanisms operates for repairing the UV induced DNA damage : light and dark repair mechanisms. Please refer to Text page # 218-220 ( Fig 7.25, 7.28) and Atlas pages 114-115. Details of the dark and light repair mechanism will be discussed in lab. Cultures: Serratia marcescenes Bacillus cereus Procedure: This is a class experiment. All results will be compiled to complete lab sheet. 1. Label each plate with the bacteria name and time ( in secs) of UV exposure. Divide the bottom into 2 halves: labeled as uv exposed and control The exposed part is the area which will be irradiated undeř UV source and the other part will be covered with index card to block UV radiation. 2. Dip a sterile cotton swab into appropriate culture tube and swab the plate as demonstrated by your instructor. Swab the agar surface making sure to cover the entire plate evenly so as to obtain a uniform lawn of bacterial cell. Dispose the swab in the appropriate biohazard bag 3. Repeat the above step with the other bacteria. 4. Remove cover (lid) of the first plate and place a index card over part of plate that will not be irradiated (this part is the control, which will be compared to the exposed area). Place plate under UV lamp for the designated time assigned for your table. Make sure, other half of the plate is covered during exposure and plate lid is removed.