A reactor is used to remove SiO2 from a wafer in semiconductor manufacturing by contacting the SiO2 surface with HF. The reactions are
6HF(g) + SiO2 (s) → H2SiF6 ( l) + 2H2O(l)
H2SiF6 ( l) → SiF4 (g) + 2HF(g)
Assume the reactor is loaded with wafers having a silicon oxide surface, a flow of 50% HF and 50% nitrogen is started, and all the H2SiF6 reacts. In the reaction 10% of the HF is consumed. What is the composition of the exhaust stream?
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