Semiconductor microchip processing often involves chemical vapor deposition (CVD) of thin layers. The material being deposited needs to have certain desirable properties. For instance, to overlay on aluminum or other bases, a phosphorus-pentoxide-doped silicon dioxide coating is deposited as a passivation (protective) coating by the simultaneous reactions
Reaction 1: SiH4 1 O2 → SiO2 + 2H2
Reaction 2: 4PH3 1 5O2 →2P2O5 + 6H2
Determine the relative masses of SiH4 and PH3 required to deposit a film of 5% by weight of phosphorus oxide (P2O5) in the protective coating.
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