Consider a semiconductor material X, with the following parameters at a room temperature of 300K: Energy...
Consider a semiconductor material X, with the following parameters at a room temperature of 300K:
Energy bandgap of Eg = 1.15 ev, density of states at the Conduction band edge of Nc = 4.8e+23, effective density of states at the Valance band edge of Nv = 1e+25, drift mobilities of the electrons and holes, ue and uh, such that ue =0.4 and uh = 0.02.
(1) What is the intrinsic concentration and conductivity of
'material x' at room temperature 300K?
(2) If semiconductor material x is doped with 10^16 donor cm^{-3}, what is the conductivity of the n-type material x at room temperature?
Homework Answers
Add Answer to:
Consider a semiconductor material X, with the following
parameters at a room temperature of 300K:
Energy...
Please explain part b in details thx! Question 2 At 300 K, the bandgap of GaP is 2.26 eV and the effective density of states at the conduction and valence band edge are 1.8 x 1019 cm23 and 1.9 x 1019...
Please explain part b in details thx!
Question 2 At 300 K, the bandgap of GaP is 2.26 eV and the effective density of states at the conduction and valence band edge are 1.8 x 1019 cm23 and 1.9 x 1019 cm3, respectively. (a) Calculate the intrinsic concentration of GaP at 300K (7 marks) Calculate the GaP effective mass of holes at 300K. (b) (8 marks) (c The GaP sample is now doped with donor concentration of 1021 cm3 with...
Consider the semiconductor CuInSe2. Its bandgap is 1.0 eV, and the effective masses of electrons and...
Consider the semiconductor CuInSe2. Its bandgap is 1.0 eV, and the effective masses of electrons and holes are .09 me and .72 me, respectively. If the material is doped such that the Fermi energy is .1 eV above the valence band edge, determine: (a) the number of electrons in the conduction band per cubic centimeter and (b) the number of holes in the valence band per cubic centimeter.
(0) If in GaAs, the Fermi level is 0.30 eV below the conduction band. [10] calculate the thermal equilibrium electron and hole concentration at room temperature. Bandgap of CaAs is 1.42 eV, the effective density of states of the conduction band at 300K i
(0)If in GaAs, the Fermi level is 0.30 eV below the conduction band. [10] calculate the thermal equilibrium electron and hole concentration at room temperature. Bandgap of CaAs is 1.42 eV, the effective density of states of the conduction band at 300K is 4.7x10 cm and the effective density of states of the valence band is 7x10¹ cm³.L213(11)Identify and illustrate with required equations and diagrams, how energy and momentum are conserved in band to band transitions in indirect band gap...
Question 8 Pure silicon at room temperature has an electron number density of about 5 ×...
Question 8 Pure silicon at room temperature has an electron number density of about 5 × 1015 m3 and an equal density of holes In the valence band. Suppose that one of every 10° silicon atoms is replaced by a phosphorus atom. (a) Which type will the doped semiconductor be, n or p? (b) What charge carrier number density will the phosphorus add? (c) What is the ratio of the charge carrier number density (electrons in the conduction band and...
A silicon semiconductor material is doped with 3x1015/cm of phosphorous atoms at room temperature (300°K). Given:...
A silicon semiconductor material is doped with 3x1015/cm of phosphorous atoms at room temperature (300°K). Given: Electron mobility is 1450 cm2/V-s, Hole mobility is 380 cm?/V-s, Intrinsic carrier concentration (n) of Si at room temperature (300°K) 1.5x 101%cm³. Calculate the conductivity of the material
Si sample doped with donors 101°cm-3 initially at room temperature 300 °K (n 31010 cm. Later it i...
Si sample doped with donors 101°cm-3 initially at room temperature 300 °K (n 31010 cm. Later it is excited optically as such 1019 cm-3electron-hole pairs are produced in one second uniformly in the sample. Si band gap energy isEg-1.11 eV and the recombination for hole electron life-time10 μs. Hint may use results of question 1 above. Draw appropriate figures and mark related levels! a) Calculate the equilibrium Fermi level with respect to conduction band edge Ec b) Calculate the equilibrium...
Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped...
Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped at 3X10-s,cm3 The intrinsic carrier density is 1.25X101°/cm and all dopants are fully ionized Assume that the effective density of states for silicon is 3.3x10 cm3 for the conduction band and 1.75x101 cm for the valence band. Assume that the temperature is 300K and silicon relative permittivity of 11.7 a. Compute the hole concentration on the n-side and electron concentration th the p-type material...
A metal, with a work function Ф,,-41 V, is deposited on an n-type silicon semiconductor with elec...
A metal, with a work function Ф,,-41 V, is deposited on an n-type silicon semiconductor with electron affinity 4.0V and energy bandgap 1.12eV. Assuming no interface states exist at the junction and operation temperature at 300K. Effective density of states in conduction band (N 3.22 x 10 cm3. Effective density of states in valence band (N) 1.83 x 10" cm 193 A) Sketch the energy band diagram for zero bias for the case when no space charge region exists at...
Question 2 A metal-semiconductor junction has barrier potential height of 1.265 V. The semiconductor is uniformly...
Question 2 A metal-semiconductor junction has barrier potential height of 1.265 V. The semiconductor is uniformly doped with 1015 cm-3 Phosphorus and the other parameters are as listed below. a) Derive the electric field distribution, E as a function distance, x at thermal equilibrium. The metal-semiconductor interface is defined as x=0. State the boundary condition used. b) Derive the potential distribution, V as a function of distance, x under thermal equilibrium. Determine the potentials at the metal-semiconductor interface (x=0) and...
i. l e blank(s). A gap suggest two-word in your answer Drift current in semiconductors is...
i. l e blank(s). A gap suggest two-word in your answer Drift current in semiconductors is due to electric [20] tield. Carriers in the band are referred to as statistics is applied to electrons in The semiconductors. The position and principle states that we cannot simultaneously determine the of electrons. Vy is a . while w is a number and Current in the conduction is due to the flow of Extrinsic semiconductors are vii. viii. The wave function in Schrodinger's...
Please explain part b in details thx!
Question 2 At 300 K, the bandgap of GaP is 2.26 eV and the effective density of states at the conduction and valence band edge are 1.8 x 1019 cm23 and 1.9 x 1019 cm3, respectively. (a) Calculate the intrinsic concentration of GaP at 300K (7 marks) Calculate the GaP effective mass of holes at 300K. (b) (8 marks) (c The GaP sample is now doped with donor concentration of 1021 cm3 with...
Question 8 Pure silicon at room temperature has an electron number density of about 5 × 1015 m3 and an equal density of holes In the valence band. Suppose that one of every 10° silicon atoms is replaced by a phosphorus atom. (a) Which type will the doped semiconductor be, n or p? (b) What charge carrier number density will the phosphorus add? (c) What is the ratio of the charge carrier number density (electrons in the conduction band and...
Si sample doped with donors 101°cm-3 initially at room temperature 300 °K (n 31010 cm. Later it is excited optically as such 1019 cm-3electron-hole pairs are produced in one second uniformly in the sample. Si band gap energy isEg-1.11 eV and the recombination for hole electron life-time10 μs. Hint may use results of question 1 above. Draw appropriate figures and mark related levels! a) Calculate the equilibrium Fermi level with respect to conduction band edge Ec b) Calculate the equilibrium...
Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped at 3X10-s,cm3 The intrinsic carrier density is 1.25X101°/cm and all dopants are fully ionized Assume that the effective density of states for silicon is 3.3x10 cm3 for the conduction band and 1.75x101 cm for the valence band. Assume that the temperature is 300K and silicon relative permittivity of 11.7 a. Compute the hole concentration on the n-side and electron concentration th the p-type material...
A metal, with a work function Ф,,-41 V, is deposited on an n-type silicon semiconductor with electron affinity 4.0V and energy bandgap 1.12eV. Assuming no interface states exist at the junction and operation temperature at 300K. Effective density of states in conduction band (N 3.22 x 10 cm3. Effective density of states in valence band (N) 1.83 x 10" cm 193 A) Sketch the energy band diagram for zero bias for the case when no space charge region exists at...
Question 2 A metal-semiconductor junction has barrier potential height of 1.265 V. The semiconductor is uniformly doped with 1015 cm-3 Phosphorus and the other parameters are as listed below. a) Derive the electric field distribution, E as a function distance, x at thermal equilibrium. The metal-semiconductor interface is defined as x=0. State the boundary condition used. b) Derive the potential distribution, V as a function of distance, x under thermal equilibrium. Determine the potentials at the metal-semiconductor interface (x=0) and...
i. l e blank(s). A gap suggest two-word in your answer Drift current in semiconductors is due to electric [20] tield. Carriers in the band are referred to as statistics is applied to electrons in The semiconductors. The position and principle states that we cannot simultaneously determine the of electrons. Vy is a . while w is a number and Current in the conduction is due to the flow of Extrinsic semiconductors are vii. viii. The wave function in Schrodinger's...
Most questions answered within 3 hours.
-
Write the ionic equations for the first stage of salts
hydrolysis.
Anion, Cation?
Na2S
NiSO4
K2SO4...
asked 12 minutes ago -
suppose there is a normally distributed population with a mean of
250 and a standard deviation...
asked 55 minutes ago -
Question Three
Suppose you as project manager are using the Waterfall
development methodology on a large...
asked 1 hour ago -
Which statement is not true about welfare in Canada?
A.Benefits typically vary based on one's ability...
asked 2 hours ago -
Please help me with FLOWCHART and UML diagram for class,
thank you!
#include <iostream>
#include <fstream>...
asked 3 hours ago -
3. Describe the “logic circuit” of the Lac operon. Which
proteins are bound or not to...
asked 3 hours ago -
Ayesha’s adjusted gross income is $60,000 in 2019. She donated a
piece of artwork with a...
asked 3 hours ago -
For Dijkstra’s shortest path algorithm:
a. Give the Big-O time for Dijkstra’s shortest path algorithm
and...
asked 3 hours ago -
Phosphorus violates the 'octet rule' in biological molecules,
forming more covalent bonds than expected based on...
asked 3 hours ago -
A 1.3 eV electron has a 10-4 probability of tunneling
through a 2.4 eV potential barrier....
asked 3 hours ago -
What is the one ingredient that is common to being successful
with all stakeholders?
profit
trust...
asked 3 hours ago -
Write an assembly language 32 bit program that reads in lines of
text by a .txt...
asked 3 hours ago