ANSWER :
Question 2 A metal-semiconductor junction has barrier potential height of 1.265 V. The semiconductor is uniformly...
An ideal metal-semiconductor (M-S) junction is formed on the n-type Si semiconductor that is uniformly doped with a donor impurity (phosphorus) concentration of 1016 cm. The metal work function is 4.5 eV, and the Si electron affinity is 4 eV. Assuming that this M-S junction is at 300K, give your best answers to the following questions. (50 points) (a) At thermal equilibrium, draw the energy band diagram including meaningful parameters (energy barriers, energy levels, depletion width, etc.). (b) Calculate the...
A metal, with a work function Ф,,-41 V, is deposited on an n-type silicon semiconductor with electron affinity 4.0V and energy bandgap 1.12eV. Assuming no interface states exist at the junction and operation temperature at 300K. Effective density of states in conduction band (N 3.22 x 10 cm3. Effective density of states in valence band (N) 1.83 x 10" cm 193 A) Sketch the energy band diagram for zero bias for the case when no space charge region exists at...
P and N type semiconductors are formed with an acceptor and donor concentration of 1×1017 cm-3 and 1×1016 cm-3 , respectively,
intrinsic carrier concentration is 1×1010 cm-3 and relative permittivity (єs
) is 12є0 @ 300K.
Given, permittivity of free space (є0
) 8.85 × 10-12 Farad/meter, KT @ 300K 0.0259 eV, q = 1.602 × 10-19 coulombs
A. Calculate the following quantities @ 300K
1. Potential Drop (in V) and Maximum Electric Field (in V/cm) across PN-junction [2 +...
Hi everyone, I have a problem about semiconductor.
Please help me with it,thanks a lot.
Background:
Question:
Physical Constants: Vacuum permittivity: £o = 8.85 x 10-14 F/cm Planck's constant: h=6.63 x 10-34 J-s Speed of light: c= 3.0 x 100 cm/s Electronic charge: q=1.60 x 10-19 C Electron rest mass: m. = 9.11 x 10-31 kg Boltzmann constant: kb = 1.38 x 10-23 J/K Thermal energy at 300 K: kBT = 0.0259 eV Energy unit conversion: 1eV = 1.60 x...
Problem 23.12 The electric potential of a very large isolated flat metal plate is V. It carries uniform distribution of charge of surface density o (C/m), or o/2 on each surface. Part A Determine V at a distance x from the plate. Consider the point to be far from the edges and assume z is much smaller than the plate dimensions Express your answer in terms of the variables V, 0, 2, and appropriate constants. ANSWER: V(2) =
Please answer the question below:
The electric potential of a very large isolated fat metal plate is V_0. It carries a uniform distribution of charge of surface density sigma (C/m^2), or sigma/2 for each surface. Determine V at a distance x from the plate. Consider the point x to be far from the edges and assume x is much smaller than the plate dimensions.
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As I mentioned in the class assume that we have a GaAs (Gallium
Arsenide) sample which was doped with excessive As to produce a
resistivity of 0.05 Ωm. Owing to the presence of an unknown
acceptor impurity the actual resistivity was 0.06Ωm, the sample
remaining n-type. What were the concentrations of donors and
acceptors present?
(Please take μe=0.85 m2/Vs and assume that all impurity atoms
are ionized)
PHYSICAL CONSTANTS Avagadro's Number NA- 6.02 x 10*23...
2. A region of space has a potential distribution that can be written as V(x, y, z) = -14xyz + 142 Volts, where x, y, and z are given in meters. a. (7 points) How much work is required to place a +10 uC charge at coordinates (x,y,z) = (10 m, 10 m, 10 m)? b. (7 points) What are the x-, y, and z-components of the electric field at coordinates (x,y,z) = (10 m, 10 m, 10 m)?
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...
please help step by step
phym316 mc 139%. question 4 (25 marks) Consider a metal bar with square cross-section that is 10 cm long and 1 cm wide. A potential difference of 250 V is applied across its ends. It has a resistivity of 10-8 2m and electron density of 6 x 10sm-3 (a) Calculate the relaxation time, T. (b) Calculate the shift in the Fermi surface due to the applied voltage. [51 15] (d) What is the thermal conductivity...