A sample of Ge is doped to the extent of 1014 cm-3 donor atoms and 7 x 10 13 cm-3 acceptor atoms. At the temperature of the sample, the resistivity of intrinsic Ge is 60 ohm-cm. If the applied electric field is 2 V cm-1, find the total conduction current density. Assume electron and hole mobilities of 3800 and 1800 cm2 V-1s-1, respectively.
A sample of Ge is doped to the extent of 1014 cm-3 donor atoms and 7...
Calculate the conductivity, in (12-cm) 1, of extrinsic Si doped with 2.02 x 1017 atoms/cm of arsenic. The electron and hole mobilities are 1350 and 450 cm2 V-s respectively. (answer format X.X)
P4. Find the resistivity at T 300 K for a silicon sample doped with 1 x 10cm of phosphorus (P) atoms, 8.5 x 10 cm of arsenic (As) atoms, and 1.2 x 103 cm3 of boron (B) atoms. Assume that the impurities are completely ionized and the mobilities are μ,-1500 cm2/V-s, μ,-500 cm2/V-s, independent of impurity concentrations. Also assume intrinsic carrier concentration of Si n 1.5 x 10 cm). Hint!!; we can usually use the rule for compensated semiconductors as...
Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped. Silicon at at T-300 K...
Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped. Silicon at at T-300 K...
Semiconductor is doped with donor impurities and has the resistivity 0.03 Ohm*cm. The donor concentration ND = 7.5 E16 cm^-3. What is the electron mobility in the material? [unit:m*m/(V*s)]
Semiconductor is doped with donor impurities and has the resistivity 0.03 Ohm*cm. The donor concentration ND = 7.5 E16 cm^-3. What is the electron mobility in the material? [unit:m*m/(V*s)]
A silicon semiconductor material is doped with 3x1015/cm of phosphorous atoms at room temperature (300°K). Given: Electron mobility is 1450 cm2/V-s, Hole mobility is 380 cm?/V-s, Intrinsic carrier concentration (n) of Si at room temperature (300°K) 1.5x 101%cm³. Calculate the conductivity of the material
Could i please have assistance in working out and theory for this question. Could i please get further explanation on how values are achieved with B and C Please a) Calculate the conductivity of an intrinsic Si conductor at 27 °C if the hole mobility is 450 cm2 V1s-1 and the electron mobility is 1350 cm2 V's1. Assume an intrinsic carrier density of 1.45 x 1010 carriers/cm3 and an electron charge of -0.16 x 10-18 C. b) Using Figure 5,...
Could i please have assistance in working out and theory for this question. a) Calculate the conductivity of an intrinsic Si conductor at 27 °C if the hole mobility is 450 cm2 V1s-1 and the electron mobility is 1350 cm2 V's1. Assume an intrinsic carrier density of 1.45 x 1010 carriers/cm3 and an electron charge of -0.16 x 10-18 C. b) Using Figure 5, calculate the conductivity of the Si intrinsic conductor if the temperature is increased to 127 °C...
3. A silicon step junction has uniform impurity doping concentrations of N. 5 x 1015 cm-3 and Nd = 1 x 1015 cm-, and a cross-sectional area of A-|0-4 cm2. Let tao -0.4 s and tpo 0.1 us. Consider the geometry in Figure.Calculate (a) the ideal reverse saturation current due to holes, (b) the ideal reverse saturation current due to electrons, (c) the hole concentration at a, if V V and (d) the electron current at x = x" +...