Semiconductor is doped with donor impurities and has the resistivity 0.03 Ohm*cm. The donor concentration ND = 7.5 E16 cm^-3. What is the electron mobility in the material? [unit:m*m/(V*s)]
Semiconductor is doped with donor impurities and has the resistivity 0.03 Ohm*cm. The donor concentration ND...
Semiconductor is doped with donor impurities and has the resistivity 0.03 Ohm*cm. The donor concentration ND = 7.5 E16 cm^-3. What is the electron mobility in the material? [unit:m*m/(V*s)]
A silicon semiconductor material is doped with 3x1015/cm of phosphorous atoms at room temperature (300°K). Given: Electron mobility is 1450 cm2/V-s, Hole mobility is 380 cm?/V-s, Intrinsic carrier concentration (n) of Si at room temperature (300°K) 1.5x 101%cm³. Calculate the conductivity of the material
Semiconductor Physics: A semiconductor has a intrinsic concentration of 1010 cm-3 and has donor impurity concentration of 1015 cm-3. Light is shined (uniformly) upon the sample generating 5*1019 electron-hole pairs.cm-3s-1 with a minority carrier lifetime of 10-6 s. What is the net electron-hole recombination rate? I think at steady state, the electron-hole recombination rate is the same as the generation rate. But the current circumstances of the question make me doubt that assumption or conclusion (the question is 4 marks).
A sample of Ge is doped to the extent of 1014 cm-3 donor atoms and 7 x 10 13 cm-3 acceptor atoms. At the temperature of the sample, the resistivity of intrinsic Ge is 60 ohm-cm. If the applied electric field is 2 V cm-1, find the total conduction current density. Assume electron and hole mobilities of 3800 and 1800 cm2 V-1s-1, respectively.
Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped. Silicon at at T-300 K...
Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped. Silicon at at T-300 K...
QUESTION 43 (10 Marks) a) Calculate the conductivity of an intrinsic silicon (SI) semiconductor at 27°C if the hole mobility is 460 cm V's and the electron mobility is 1350 cm? Vis! Assume an intrinsic carrier density of 1.45 x 10 carriers/cm' and an electron charge of -0.16 x 10-4C (3 marks) b) Using Figure 8, calculate the conductivity of the Si intrinsic semiconductor if the temperature is increased to 150°C, assuming the same electron and hole mobilities (2 marks)...
Find the resistivity at 300 K for a silicon sample doped with 1.0 times 10^14 cm^-3 of phosphorous atoms, 8.5 times 10^13 cm^-3 of arsenic atoms, and 1.2 times 10^13 cm^-3 of boron atoms. Assume that the impurities are completely ionized and the mobilities are mu_n = 1500 cm^2/V-s, mu_p = 500 cm^2/V-s, independent of impurity concentrations.
A Hall sample is made of p-type silicon doped with 1019 borons/cm². Its resistivity is 0.009 ohm-cm. The sample has a cross section of 0.2mmx2mm and a length of 50mm. A voltage of 10V is applied in the longitudinal (length) direction. The effective mass of holes is 2 of electron rest mass. Temperature is 300K. Calculate: a. The Hall coefficient, b. Hole mobility, c. Longitudinal electrical field, d. Drift velocity, e. Mean free time, f. The Hall voltage across 2mm...
P4. Find the resistivity at T 300 K for a silicon sample doped with 1 x 10cm of phosphorus (P) atoms, 8.5 x 10 cm of arsenic (As) atoms, and 1.2 x 103 cm3 of boron (B) atoms. Assume that the impurities are completely ionized and the mobilities are μ,-1500 cm2/V-s, μ,-500 cm2/V-s, independent of impurity concentrations. Also assume intrinsic carrier concentration of Si n 1.5 x 10 cm). Hint!!; we can usually use the rule for compensated semiconductors as...