1.) Determine the intrinsic carrier density in Germanium and Gallium Arsenide at 27°C The mass of...
.1. Sketch the atomic structure of copper and discuss why it is a good conductor and how its structure is different from that of germanium, silicon, and gallium arsenide. 2. Determine the thermal voltage for a diode at a temperature of 20°C. 3. Given a diode current of 6 mA, Vr= 26 mV, n= 1, and Is= 1 nA, find the applied voltage VD. 4. Compare the characteristics of a silicon and a germanium diode and determine which you would prefer to use...
1. (a) Calculate the value of ni for gallium arsenide (GaAs) at T = 300 K. The constant B = 3.56 × 1014cm−3K 3/2 and the bandgap voltage Eg = 1.42 eV. [5 marks] (b) In a phosphorus-doped silicon layer with impurity concentration of 1017/cm3 , find the hole and electron concentrations at 27oC and 125oC [5 marks] 2. A young designer, aiming to develop intuition concerning conducting paths within an integrated circuit, examines the end-to-end resistance of a connecting...
4) Gallium arsenide (GaAs) is a semiconductor material of great interest for its high power-handling capabilities and fast response time. (a) Calculate the drift speed of electrons in GaAs for a field of 10 V/cm if the electron mobility is un = 8500 cm2/Vs. (b) What percent of the electron's thermal speed at 300 K is this drift speed? (c) Assuming an effective electron mass equal to the free electron mass, calculate the average time between electron collisions. (d) Calculate...
**Please Show All The Steps** As I mentioned in the class assume that we have a GaAs (Gallium Arsenide) sample which was doped with excessive As to produce a resistivity of 0.05 Ωm. Owing to the presence of an unknown acceptor impurity the actual resistivity was 0.06Ωm, the sample remaining n-type. What were the concentrations of donors and acceptors present? (Please take μe=0.85 m2/Vs and assume that all impurity atoms are ionized) PHYSICAL CONSTANTS Avagadro's Number NA- 6.02 x 10*23...
The silicon diode shown in the given figure is described by ip = I. (ed/- 1) where at T = 300 K, 1. = 250 x 10-12 A, VT = KT 26 mV, vs = Vs + V3 = 4.2V + 110 cos(wt) mV,w = 377 rad/s, and R = 10 ko. The DC operating (quiescent) point Q and the AC small-signal equivalent resistance at Q are as follows: IDQ = 0.548 mA, VDQ = 0.365 V, and ra =...
A common source amplifier circuit based on a single n-channel MOSFET is shown in Figure 4b. Assume that the transconductance gm-60 mS (equivalent to mA/ V) and drain source resistance, os, is so large it may be neglected. 0) Calculate the open circuit voltage gain Av Yout/ Vis. i) The amplifier has a load of 10 k2. Determine the current gain Va. = 12 V 150k 4k3 Vout Vin 200k GND = 0 V Figure 4b a) State the name...
= 8.05 - 1022 - 1.21 . 1023 VD (Linear Fit) 1/C? (1/F?) 0.0 0.5 100.0 -3.5 -3.0 -2.5 -2.0 -1.5 -1.0 -0.5 Voltage (V) Figure 1: CV data for a Silicon p-n junction diode. 2. A colleague hands you CV data (capacitance vs voltage) of a silicon p-n junction diode shown in Figure 1. For this particular diode, the donor concentration on the n-side is much larger than the acceptor concentration on the p-side (i.e. Np > NA) and...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...