Note: I am allowed to answer only 1 question and four of it's sub-parts- Sorry about that
(a)
n- type : It is a semi-conductor that contains predominantly electrons as charge carriers
p -type :It is a semi-conductor that contains predominantly holes as charge carriers
(b)
------- for n-type
= 8.6 X 10^(-5) ev/K X 300 X ln [4.5 X 10^(16)/2.4 x 10^(13)]
= 0.194 eV
For p-type
Ei-Ef = kT ln(p/ni) = 8.6 X 10^(-5) ev/K X 300 X ln(10^16/1.45 X 10^(10)) = 0.347 eV
(c)
(d) This junction is called p-n junction and can be used as a rectifier. Suppose you put an AC voltage across this junction when +ve voltage is on p-type and -ve voltage is n-type ,then the barrier level goes down and and current flows across barrier in form of hole and electrons. However,in the other half of AC power cycle the P-type is negatively charged and n -type is ositively charged ,the potential barrier at junction increases and hence no current flows and thus the output you get is rectified power allowed to flow in one-half of AC cycle.
9. An n- type germanium semiconductor sample is brought into contact with a p - type...
7. Find the position of the intrinsic Fermi level with respect to Emidgap for silicon, germanium, gallium arsenide, and indium arsenide. Use the effective density of states values from problem 5. 8. a. Draw a band diagram for silicon doped 107/cmp-type and label the band gap and the position of the Fermi level. b. Draw a band diagram for gallium arsenide doped 10/cmn-type and label the band gap and the position of the Fermi level. c. Draw a band diagram...
B2 Consider a diode formed by making a p-n junction structure in a silicon sample as shown in Fig. B2. nt laver p-type Si Fig. B2 (a). If the dopant concentrations of the n layer and the p-type silicon are 6x101" cm and 8x10 cm respectively, calculate the built-in potential of the p-n junction at room temperature (300 K) 15 (3 marks) (b). Due to overheating of the silicon sample, the diode has an operation temperature of 200 °C and...
Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped at 3X10-s,cm3 The intrinsic carrier density is 1.25X101°/cm and all dopants are fully ionized Assume that the effective density of states for silicon is 3.3x10 cm3 for the conduction band and 1.75x101 cm for the valence band. Assume that the temperature is 300K and silicon relative permittivity of 11.7 a. Compute the hole concentration on the n-side and electron concentration th the p-type material...
Experiment 11: Investigating Bandgap Energies, Materials, and Design of Light-Emitting Diodes (LED) 3. For a device to be a good conductor, there must be a significant electron population in the conduction band. When no energy is supplied to a semiconductor, the relative population of the conduction band follows Boltzmann's population law. In the case of a diode, the equation is: CB Population = e /RT VB Population Where CB and VB population are the respective electron populations in the conduc-...
A semiconductor sample is doped p-type with 1017 boron atoms/cm3 (assume p=Na). Where is the Fermi level of the p-type material, ???, relative to the intrinsic Fermi level, ???? (for this sample at 300K, the intrinsic electron concentration ?? = 2 × 1013 ??−3 ).
Define the majority carrier concentration in an n-type Si semiconductor in terms of the conduction band edge energy E, and the Fermi energy E. 1. 2 marks Find an expression for Ee -Ef, i.e, the difference between the conduction band edge energy and the Fermi energy in terms of the donor concentration ND. 4 marks Determine the concentration of donor impurity atoms that must be added to silicon so that Ec- E0.2 eV. 3 marks
1. Define the majority carrier concentration in an n-type Si semiconductor in terms of the conduction band edge energy Ec and the Fermi energy Ep 2 marks Find an expression for Ec - Ep, i.e, the difference between the conduction band edge energy and the Fermi energy in terms of the donor concentration Np. 4 marks Determine the concentration of donor impurity atoms that must be added to silicon that Ec Ef = 0.2 eV So 4 marks
Problem 1 Using what we have leamed in chapter 1, derive, for a semiconductor, the expressions of The total current density Conductivity - Problem 2 Consider Germanium sample with the following characteristics the electron and hole mobility for Ge is 0.39 and 0.19 m2N.s The electron and hole effectives masses are 0.56me and 0.4 me The energy gap is 0.67 eV at T-27°C 1) 2) Find the intrinsic carrier concentration for Ge What is the resistivity of the Ge sample...
Problem 5. We want to make a Schottky diode on one surface of an n-type semiconductor, and an ohmic contact on the other side. The electron affinity is 5 eV, bandgap is 1.5 eV, and the Fermi potential (the difference between the Fermi level Ef and the intrinsic level Ei) is 0.25 eV d the values of the work functions of the two metals be? (Give your answer as greater than or less than certain values.) Sketch the band diagram...
(2) In a semiconductor with an energy gap Eg between the valence and the conduction bands we can take Ef (the Fermi energy) to be halfway between the bands (see figure below): Conduction band Energy gap Eg Valence band Semiconductor a. Show that for a typical semiconductor or insulator at room temperature the Fermi- Dirac factor is approximately equal to exp(-E 2kBT). (Typical Eg for semi-conductors ranges from about 0.5eV to 6eV at T-293K.) b. In heavily doped n-type silicon,...