Question

9. An n- type germanium semiconductor sample is brought into contact with a p - type silicon sample. The germanium sample has a carrier concentra- tion of 4.5 x 1016cm-3 and the silicon sample has a carrier concentration of 1.0 × 1016cm-3. At 300K the intrinsic carrier concentration of germanium is 2.4 × 1013cm-3 and its band gap is 0.66 eV. At 300K the intrinsic carrier concentration of silicon is 1.45 × 1010cm-3 and its band gap is 1.12 eV. (a) Describe the differences between an n - type semiconductor and a p - type semiconductor. (b) Calculate the energy difference between the centre of the band gap and the Fermi level in both cases. (c) Draw a labeled diagram showing the edges of the bands of the semicon- ductors and the Fermi level(s) when the semiconductors are brought into contact. Show the region near the junction on both sides of the Junction. (d) Name the type of junction and briefly discuss one application 10. Select one of the following devices: Solar-cell, photodetector, avalanche photodiode, LED (light emitting diode) OLED (Or- ganic LED), semiconductor laser diode, VCSEL (vertical cavity surface emitting laser), LCD (liquid crystal display) Explicitly state the device you have chosen For your chosen device, answer the following (i) What is the main purpose of the device? (ii) State two to three applications of the device, including details of the use. (iii) Sketch (including labels) the device. Include all elements necessary for the device to function correctly. (iv) Explain the principles of how the device operates. Refer to your diagram fronm part (c) (iii). Include details of the standard operating conditions (applied cur- rent, direction of current, voltage, temperature etc.). Include band diagrams where appropriate (v) Discuss in detail the basic physical principles underlying the device (vi) Explain the fabrication methods and required processing steps to fab- (vii) Discuss applications of the device. operation ricate this device

0 0
Add a comment Improve this question Transcribed image text
Answer #1

Note: I am allowed to answer only 1 question and four of it's sub-parts- Sorry about that

(a)

n- type : It is a semi-conductor that contains predominantly electrons as charge carriers

p -type :It is a semi-conductor that contains predominantly holes as charge carriers

(b)

Ef- Ei= kT ln(n/ni) ------- for n-type

= 8.6 X 10^(-5) ev/K X 300 X ln [4.5 X 10^(16)/2.4 x 10^(13)]

= 0.194 eV

For p-type

Ei-Ef = kT ln(p/ni) = 8.6 X 10^(-5) ev/K X 300 X ln(10^16/1.45 X 10^(10)) = 0.347 eV

(c)

geo Po >> >no Neuke PERE ん Nusc Apo no E, le:

(d) This junction is called p-n junction and can be used as a rectifier. Suppose you put an AC voltage across this junction when +ve voltage is on p-type and -ve voltage is n-type ,then the barrier level goes down and and current flows across barrier in form of hole and electrons. However,in the other half of AC power cycle the P-type is negatively charged and n -type is ositively charged ,the potential barrier at junction increases and hence no current flows and thus the output you get is rectified power allowed to flow in one-half of AC cycle.

Add a comment
Know the answer?
Add Answer to:
9. An n- type germanium semiconductor sample is brought into contact with a p - type...
Your Answer:

Post as a guest

Your Name:

What's your source?

Earn Coins

Coins can be redeemed for fabulous gifts.

Not the answer you're looking for? Ask your own homework help question. Our experts will answer your question WITHIN MINUTES for Free.
Similar Homework Help Questions
  • 7. Find the position of the intrinsic Fermi level with respect to Emidgap for silicon, germanium,...

    7. Find the position of the intrinsic Fermi level with respect to Emidgap for silicon, germanium, gallium arsenide, and indium arsenide. Use the effective density of states values from problem 5. 8. a. Draw a band diagram for silicon doped 107/cmp-type and label the band gap and the position of the Fermi level. b. Draw a band diagram for gallium arsenide doped 10/cmn-type and label the band gap and the position of the Fermi level. c. Draw a band diagram...

  • B2 Consider a diode formed by making a p-n junction structure in a silicon sample as shown in Fig. B2. nt laver p-type...

    B2 Consider a diode formed by making a p-n junction structure in a silicon sample as shown in Fig. B2. nt laver p-type Si Fig. B2 (a). If the dopant concentrations of the n layer and the p-type silicon are 6x101" cm and 8x10 cm respectively, calculate the built-in potential of the p-n junction at room temperature (300 K) 15 (3 marks) (b). Due to overheating of the silicon sample, the diode has an operation temperature of 200 °C and...

  • Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped...

    Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped at 3X10-s,cm3 The intrinsic carrier density is 1.25X101°/cm and all dopants are fully ionized Assume that the effective density of states for silicon is 3.3x10 cm3 for the conduction band and 1.75x101 cm for the valence band. Assume that the temperature is 300K and silicon relative permittivity of 11.7 a. Compute the hole concentration on the n-side and electron concentration th the p-type material...

  • Experiment 11: Investigating Bandgap Energies, Materials, and Design of Light-Emitting Diodes (LED) 3. For a device...

    Experiment 11: Investigating Bandgap Energies, Materials, and Design of Light-Emitting Diodes (LED) 3. For a device to be a good conductor, there must be a significant electron population in the conduction band. When no energy is supplied to a semiconductor, the relative population of the conduction band follows Boltzmann's population law. In the case of a diode, the equation is: CB Population = e /RT VB Population Where CB and VB population are the respective electron populations in the conduc-...

  • A semiconductor sample is doped p-type with 1017 boron atoms/cm3 (assume p=Na). Where is the Fermi...

    A semiconductor sample is doped p-type with 1017 boron atoms/cm3 (assume p=Na). Where is the Fermi level of the p-type material, ???, relative to the intrinsic Fermi level, ???? (for this sample at 300K, the intrinsic electron concentration ?? = 2 × 1013 ??−3 ).

  • Define the majority carrier concentration in an n-type Si semiconductor in terms of the conduction band...

    Define the majority carrier concentration in an n-type Si semiconductor in terms of the conduction band edge energy E, and the Fermi energy E. 1. 2 marks Find an expression for Ee -Ef, i.e, the difference between the conduction band edge energy and the Fermi energy in terms of the donor concentration ND. 4 marks Determine the concentration of donor impurity atoms that must be added to silicon so that Ec- E0.2 eV. 3 marks

  • 1. Define the majority carrier concentration in an n-type Si semiconductor in terms of the conduction...

    1. Define the majority carrier concentration in an n-type Si semiconductor in terms of the conduction band edge energy Ec and the Fermi energy Ep 2 marks Find an expression for Ec - Ep, i.e, the difference between the conduction band edge energy and the Fermi energy in terms of the donor concentration Np. 4 marks Determine the concentration of donor impurity atoms that must be added to silicon that Ec Ef = 0.2 eV So 4 marks

  • Problem 1 Using what we have leamed in chapter 1, derive, for a semiconductor, the expressions of...

    Problem 1 Using what we have leamed in chapter 1, derive, for a semiconductor, the expressions of The total current density Conductivity - Problem 2 Consider Germanium sample with the following characteristics the electron and hole mobility for Ge is 0.39 and 0.19 m2N.s The electron and hole effectives masses are 0.56me and 0.4 me The energy gap is 0.67 eV at T-27°C 1) 2) Find the intrinsic carrier concentration for Ge What is the resistivity of the Ge sample...

  • Problem 5. We want to make a Schottky diode on one surface of an n-type semiconductor, and an ohm...

    Problem 5. We want to make a Schottky diode on one surface of an n-type semiconductor, and an ohmic contact on the other side. The electron affinity is 5 eV, bandgap is 1.5 eV, and the Fermi potential (the difference between the Fermi level Ef and the intrinsic level Ei) is 0.25 eV d the values of the work functions of the two metals be? (Give your answer as greater than or less than certain values.) Sketch the band diagram...

  • (2) In a semiconductor with an energy gap Eg between the valence and the conduction bands we can take Ef (the Fermi ene...

    (2) In a semiconductor with an energy gap Eg between the valence and the conduction bands we can take Ef (the Fermi energy) to be halfway between the bands (see figure below): Conduction band Energy gap Eg Valence band Semiconductor a. Show that for a typical semiconductor or insulator at room temperature the Fermi- Dirac factor is approximately equal to exp(-E 2kBT). (Typical Eg for semi-conductors ranges from about 0.5eV to 6eV at T-293K.) b. In heavily doped n-type silicon,...

ADVERTISEMENT
Free Homework Help App
Download From Google Play
Scan Your Homework
to Get Instant Free Answers
Need Online Homework Help?
Ask a Question
Get Answers For Free
Most questions answered within 3 hours.
ADVERTISEMENT
ADVERTISEMENT
ADVERTISEMENT