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All needed data is given. Kindly solve all parts of the problem (CLEARLY).. assume ni = 1x10^10 i...
It is about our school's assginment. But i cannot understand and figure out how to solve it.. Ser...
It is about our school's
assginment. But i cannot understand and figure out how to solve
it.. Seriously i need your help. Thank you.
Assignment: Consider a thin Si sample with two metallic contacts on each side. The structure is at room temperature in thermal equilibrium and the doping is ND1015 cm everywhere. The Schottky barrier height of both metal-semiconductor junctions is qpBn - 0.7 eV. For the following three situations,) calculate the electron and hole concentrations and the electric...
Problem 7: MS contact n-type Si Consider a contact between NiSi and n-type silicon with N 10 cm m...
All needed data is given. Please solve clearly.
Problem 7: MS contact n-type Si Consider a contact between NiSi and n-type silicon with N 10 cm maintained at T 300K. (a) Draw the equilibrium 0 V) energy-band diagram, indicating numerical values for the Schottky barrier height Фв , depletion-layer width W, Ec-Ep in the neutral region, and built-in potential li (Note: Use the Schottky barrier value given in Lecture #7) (b) Draw the energy-band diagram for an applied bias V-0.5...
An ideal metal-semiconductor (M-S) junction is formed on the n-type Si semiconductor that is uniformly doped...
An ideal metal-semiconductor (M-S) junction is formed on the n-type Si semiconductor that is uniformly doped with a donor impurity (phosphorus) concentration of 1016 cm. The metal work function is 4.5 eV, and the Si electron affinity is 4 eV. Assuming that this M-S junction is at 300K, give your best answers to the following questions. (50 points) (a) At thermal equilibrium, draw the energy band diagram including meaningful parameters (energy barriers, energy levels, depletion width, etc.). (b) Calculate the...
A metal, with a work function Ф,,-41 V, is deposited on an n-type silicon semiconductor with elec...
A metal, with a work function Ф,,-41 V, is deposited on an n-type silicon semiconductor with electron affinity 4.0V and energy bandgap 1.12eV. Assuming no interface states exist at the junction and operation temperature at 300K. Effective density of states in conduction band (N 3.22 x 10 cm3. Effective density of states in valence band (N) 1.83 x 10" cm 193 A) Sketch the energy band diagram for zero bias for the case when no space charge region exists at...
1. A metal/n-GaAs Schottky Barrier is formed by depositing platinum on n-GaAs. The electron affinity of...
1. A metal/n-GaAs Schottky Barrier is formed by depositing platinum on n-GaAs. The electron affinity of GaAs is 4.0 eV. The work function of Pt is 5.0 eV. The doping in GaAs is 1E16/cm3, and Nc=5E17/cm3. i) Draw the thermal equilibrium energy band diagram for the structure ii) Calculate the barrier height and the built-in voltage iii) Calculate the depletion width in GaAs, given ε(total) for GaAs=1E-12 F/cm --> w=sqrt((2*ε*Vbi)/(q*ND)) iv) Calculate the depletion capacitance for 1 cm2 area v)...
Problem 1 (25 points) Si at T = 300K contains donor impurity atoms at a density of 5x 10'6cm and ...
Problem 1 (25 points) Si at T = 300K contains donor impurity atoms at a density of 5x 10'6cm and acceptor impurity atoms at a density of 2x106 cm-3 . Assume ni 1.5x10'0cm-3, kT-0.026eV a) (5 points) Is the semiconductor n type or p type? b) (10 points) Determine n, and Po c) (10 points) Draw the energy band diagram (Ec, Ev, EFi, Ef) and indicate the position of Ef with respect to Epi
Problem 1 (25 points) Si at...
EENG 245 Physical electronics HW 1 1) The NaCl crystal is cubic, and can be described...
EENG 245 Physical electronics HW 1 1) The NaCl crystal is cubic, and can be described as follows. Na atoms sit at the corners and faces of a cube, and Cl atoms sit in between two Na atoms. This means that a Clatom is found half-way along each of the cube edges, and there is a Cl in the center of the cube. (We could also have described the lattice by interchanging Na and Cl in the description above.) Another...
**Please Show All The Steps** As I mentioned in the class assume that we have a...
**Please Show All The Steps**
As I mentioned in the class assume that we have a GaAs (Gallium
Arsenide) sample which was doped with excessive As to produce a
resistivity of 0.05 Ωm. Owing to the presence of an unknown
acceptor impurity the actual resistivity was 0.06Ωm, the sample
remaining n-type. What were the concentrations of donors and
acceptors present?
(Please take μe=0.85 m2/Vs and assume that all impurity atoms
are ionized)
PHYSICAL CONSTANTS Avagadro's Number NA- 6.02 x 10*23...
It is about our school's
assginment. But i cannot understand and figure out how to solve
it.. Seriously i need your help. Thank you.
Assignment: Consider a thin Si sample with two metallic contacts on each side. The structure is at room temperature in thermal equilibrium and the doping is ND1015 cm everywhere. The Schottky barrier height of both metal-semiconductor junctions is qpBn - 0.7 eV. For the following three situations,) calculate the electron and hole concentrations and the electric...
All needed data is given. Please solve clearly.
Problem 7: MS contact n-type Si Consider a contact between NiSi and n-type silicon with N 10 cm maintained at T 300K. (a) Draw the equilibrium 0 V) energy-band diagram, indicating numerical values for the Schottky barrier height Фв , depletion-layer width W, Ec-Ep in the neutral region, and built-in potential li (Note: Use the Schottky barrier value given in Lecture #7) (b) Draw the energy-band diagram for an applied bias V-0.5...
An ideal metal-semiconductor (M-S) junction is formed on the n-type Si semiconductor that is uniformly doped with a donor impurity (phosphorus) concentration of 1016 cm. The metal work function is 4.5 eV, and the Si electron affinity is 4 eV. Assuming that this M-S junction is at 300K, give your best answers to the following questions. (50 points) (a) At thermal equilibrium, draw the energy band diagram including meaningful parameters (energy barriers, energy levels, depletion width, etc.). (b) Calculate the...
A metal, with a work function Ф,,-41 V, is deposited on an n-type silicon semiconductor with electron affinity 4.0V and energy bandgap 1.12eV. Assuming no interface states exist at the junction and operation temperature at 300K. Effective density of states in conduction band (N 3.22 x 10 cm3. Effective density of states in valence band (N) 1.83 x 10" cm 193 A) Sketch the energy band diagram for zero bias for the case when no space charge region exists at...
Problem 1 (25 points) Si at T = 300K contains donor impurity atoms at a density of 5x 10'6cm and acceptor impurity atoms at a density of 2x106 cm-3 . Assume ni 1.5x10'0cm-3, kT-0.026eV a) (5 points) Is the semiconductor n type or p type? b) (10 points) Determine n, and Po c) (10 points) Draw the energy band diagram (Ec, Ev, EFi, Ef) and indicate the position of Ef with respect to Epi
Problem 1 (25 points) Si at...
EENG 245 Physical electronics HW 1 1) The NaCl crystal is cubic, and can be described as follows. Na atoms sit at the corners and faces of a cube, and Cl atoms sit in between two Na atoms. This means that a Clatom is found half-way along each of the cube edges, and there is a Cl in the center of the cube. (We could also have described the lattice by interchanging Na and Cl in the description above.) Another...
**Please Show All The Steps**
As I mentioned in the class assume that we have a GaAs (Gallium
Arsenide) sample which was doped with excessive As to produce a
resistivity of 0.05 Ωm. Owing to the presence of an unknown
acceptor impurity the actual resistivity was 0.06Ωm, the sample
remaining n-type. What were the concentrations of donors and
acceptors present?
(Please take μe=0.85 m2/Vs and assume that all impurity atoms
are ionized)
PHYSICAL CONSTANTS Avagadro's Number NA- 6.02 x 10*23...
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