Vanadium oxides are of interest for various sensor applications, owing to the sharp metal-insulator transitions they undergo as a function of temperature, pressure, or stress. Vanadium triisopropoxide (VTIPO) was used to grow vanadium oxide films by chemical vapor deposition [J.Electrochem. Soc. , 136, 897 (1989)] . The deposition rate as a function of VTIPO pressure for two different temperatures follows:
T = 120°C:
Growth Rate (μm/h) | 0.004 | 0.015 | O.Q25 | 0.04 | 0.068 | 0.08 | O.Q95 | 0.1 |
VTIPO Pressure (toorr) | 0.1 | 0.2 | 0.3 | 0.5 | 0.8 | 1.0 | 1.5 | 2.0 |
T = 200°C:
Growth Rate (μm/h)) | O.028 | 0.45 | 1.8 | 2.8 | 7.2 |
VTIPO Pressure (toorr) | 0.05 | 0.2 | 0.4 | 0.5 | 0.8 |
In light of the material presented in this chapter, analyze the data and describe your results. Specify where additional data should be taken.
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