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a. Given an MOS structure made of p-type Si( Na 1017 cm, relative permittivity of 11.7)...
For a MOS-structure with an n-type Si, (a) estimate the inversion voltage onset assuming that the flat band condition is Vo 0.5V and draw the corresponding energy band diagram. (b) Using ND 5*101...
For a MOS-structure with an n-type Si, (a) estimate the inversion voltage onset assuming that the flat band condition is Vo 0.5V and draw the corresponding energy band diagram. (b) Using ND 5*1017 cm3, calculate thickness of the depletion region under applied 1V bias (assume depletion mode) (c) For the same MOS structure, sketch a C-V curve and (d) calculate high-frequency maximum and minimum capacitances assuming metal contact area of 10 um2 and Si thickness of 500A (SiO2 dielectric constant...
Problem 1. An n-channel MOS transistor is fabricated with the following specifications: Substrate is a p-type...
Problem 1. An n-channel MOS transistor is fabricated with the following specifications: Substrate is a p-type silicon with doping concentration NA=2x1015 cm-3 . The SiO2 gate thickness is 200 Å. Effective interface charges Qi=6.5x10-9 col/cm2. Work function difference between gate conductor and silicon substrate qфms=-0.95 eV. Calculate the following: a. Maximum depletion width, with respect to ground b. Gate capacitance per unit area, Ci c. Flat-band voltage, VFB d. Threshold voltage, VT.
Assignment-2) Consider a MOS structure made out of a W gate (WM = 4.54 eV), a 4.5 nm SiO2 insulator, and a p-type Si substrate with NA = 6x1017 cm-3. Estimate the electric field in the oxide and the s...
Assignment-2) Consider a MOS structure made out of a W gate (WM = 4.54 eV), a 4.5 nm SiO2 insulator, and a p-type Si substrate with NA = 6x1017 cm-3. Estimate the electric field in the oxide and the surface potential at zero bias.
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl =...
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl = 1.5 x 1010 cm3 Co [Farads] 3.45x1011 >Va [Volts] 1.0 0.3 (a) Is the semiconductor (silicon) substrate doped n-type or p-type? Explain briefly. (b) Is the measurement frequency low or high? Explain briefly. (c) What is the thickness of the gate oxide (SiO2), xo? (d) Estimate the...
Problem 3 (25 points) Consider a MOS capacitor with p polysilicon gate and p-type silicon substrate with NA 1016 cm3. Ef- Ev in the polysilicon gate. Assume the following parameters: I200A, , 1.5x10°...
Problem 3 (25 points) Consider a MOS capacitor with p polysilicon gate and p-type silicon substrate with NA 1016 cm3. Ef- Ev in the polysilicon gate. Assume the following parameters: I200A, , 1.5x10° cm*,E, -3.9x8.854x104FIcm ox a) (5 points) Calculate the metal-semiconductor work function difference. b) (5 points) Calculate the surface potential at the threshold inversion. c) (5 points) Calculate the depletion width (in μm) at the threshold inversion. d) (5 points) Calculate the flat band voltage. e) (5 points)...
Q1 Which of the following is true for a MOS capacitor with a P-type body? Select...
Q1 Which of the following is true for a MOS capacitor with a P-type body? Select one: a. The charge in the inversion layer stays approximately constant as the gate voltage is increased above the threshold voltage b. The charge in the depletion region is proportional to the square root of the depletion region width, assuming that the body is uniformly doped c. In inversion, the total charge is equal to the sum of the charge in the depletion region...
For a MOS-structure with an n-type Si, (a) estimate the inversion voltage onset assuming that the flat band condition is Vo 0.5V and draw the corresponding energy band diagram. (b) Using ND 5*1017 cm3, calculate thickness of the depletion region under applied 1V bias (assume depletion mode) (c) For the same MOS structure, sketch a C-V curve and (d) calculate high-frequency maximum and minimum capacitances assuming metal contact area of 10 um2 and Si thickness of 500A (SiO2 dielectric constant...
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl = 1.5 x 1010 cm3 Co [Farads] 3.45x1011 >Va [Volts] 1.0 0.3 (a) Is the semiconductor (silicon) substrate doped n-type or p-type? Explain briefly. (b) Is the measurement frequency low or high? Explain briefly. (c) What is the thickness of the gate oxide (SiO2), xo? (d) Estimate the...
Problem 3 (25 points) Consider a MOS capacitor with p polysilicon gate and p-type silicon substrate with NA 1016 cm3. Ef- Ev in the polysilicon gate. Assume the following parameters: I200A, , 1.5x10° cm*,E, -3.9x8.854x104FIcm ox a) (5 points) Calculate the metal-semiconductor work function difference. b) (5 points) Calculate the surface potential at the threshold inversion. c) (5 points) Calculate the depletion width (in μm) at the threshold inversion. d) (5 points) Calculate the flat band voltage. e) (5 points)...
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