(iv) Explain what process(es) will be different at the higher temperature producing the different features from...
(b) A structure that we sometimes encounter in electronic devices is a so-called p-i-n structure, consisting of a p-doped layer, an intrinsic layer and then an n-doped layer as shown in the drawing below. Assume Si as the semiconductor: Ps. Intrinsic n kx10cn' 5XIOCA p layer Intrinsic layer n layer Majority carrier concentration Minority carrier concentration Electrical Conductivity
(b) A structure that we sometimes encounter in electronic devices is a so-called p-i-n structure, consisting of a p-doped layer, an intrinsic layer and then an n-doped layer as shown in the drawing below. Assume Si as the semiconductor: n Pis. Intrinsic 5 X IOC kx10 can player Intrinsic layer n layer Majority carrier concentration Minority carrier concentration Electrical Conductivity
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...
2 photos The depletion layer width for different junctions is given by the following equations: w = het w = jane te pare VO w = (1280XL) Intrinsic carrier concentration of silicon, n., is 9.65 x 10 cm 1) The expressions for minority carrier diffusion length and diffusion coefficients and thermal velocity are as follows (for n-and p-type materials). L. - (Dpt) La = (Dat)* Và = To 1/NA in p-type material 1 - 1/(RexNA), where Re is the recombination...
5. a. Draw simple band pictures to distinguish a metallic conductor from a semi-conductor. b. Explain how and why the temperature dependence of the electrical conductivity can be used to distinguish a metallic conductor from a semiconductor. c. Pure niobium oxide (NiO) is an insulator. When it is heated in the presence of oxygen gas the resulting material becomes a semiconductor. Does the oxidation of Ni(II) to Ni(III) correspond to n-doping or p-doping? Explain using band pictures.
Module 6: Temperature Dependence of n andp Worksheet Concept Map: Equilibrium carrier densities and Temperature. To Do: 1) Assume ND-NA-E+15cm-3, in two different slabs of semiconductor (1 each doping type). Plot n/ND, p/Na at 100K, 300K, 500K for each wafer. These should be equivalent to freeze out-intrinsic plot discussed in Lecture.
Problem 1 Using what we have leamed in chapter 1, derive, for a semiconductor, the expressions of The total current density Conductivity - Problem 2 Consider Germanium sample with the following characteristics the electron and hole mobility for Ge is 0.39 and 0.19 m2N.s The electron and hole effectives masses are 0.56me and 0.4 me The energy gap is 0.67 eV at T-27°C 1) 2) Find the intrinsic carrier concentration for Ge What is the resistivity of the Ge sample...
Please help me out.. Need to pass this course as a removal for my other course.. Si material parameters: Band gap energy at 300 K: Eg = 1.124 eV Relative permittivity: x = 11.7 Effective mass of electron: m =1.08m for density of states, Effective mass of hole: m = 0.81m for density of states, m = 0.26m for conductivity m =0.39m for conductivity Up = 470 cm/V.s Mobility: Un = 1400 cm /V-s, Diffusion coefficient: Do = 36 cm²/s,...
9. An n- type germanium semiconductor sample is brought into contact with a p - type silicon sample. The germanium sample has a carrier concentra- tion of 4.5 x 1016cm-3 and the silicon sample has a carrier concentration of 1.0 × 1016cm-3. At 300K the intrinsic carrier concentration of germanium is 2.4 × 1013cm-3 and its band gap is 0.66 eV. At 300K the intrinsic carrier concentration of silicon is 1.45 × 1010cm-3 and its band gap is 1.12 eV....
Please help with this homework problem please, I would appriciate it very much if you would break me into this. Thank You Q8) As was discussed in Section 1 b, an expression for the intrinsic carrier concentration in a semiconductor is given by: np = n = N N, exp E kᎢ Where N and N, are the so-called density of states and are given by N = 2 211m ky h- And N = 2 211m kT h For...