Shown below is an ideal Tunnel Field Effect Transistor (TFET). The p and n regions are non-degenerately doped with dopant concentrations of 1014 cm-3 and 1015 cm-3, respectively. The intrinsic carrier concentration in the semiconductor i
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Shown below is an ideal Tunnel Field Effect Transistor (TFET).
The p and n regions are...
Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped...
Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped at 3X10-s,cm3 The intrinsic carrier density is 1.25X101°/cm and all dopants are fully ionized Assume that the effective density of states for silicon is 3.3x10 cm3 for the conduction band and 1.75x101 cm for the valence band. Assume that the temperature is 300K and silicon relative permittivity of 11.7 a. Compute the hole concentration on the n-side and electron concentration th the p-type material...
In a semiconductor it can be shown that the product of the electron and hole densities...
In a semiconductor it can be shown that the product of the electron and hole densities is the square of the intrinsic density, i.e., pm n. Find the equilibrium electron (n) and hole (p) concentrations and the location of the Fermi level (EF) referenced to the conduction band (Ec) or valence band (Ev) in Si at 27°C if the Si contains the following concentrations of shallow dopant atoms: a) 1x1016 cm-3 boron atoms b) 3x1016 cm-3 arsenic atoms and 2.9x1016...
Draw the energy band diagram at equilibrium for the p+ /n/p semiconductor heterostructure (p+ indicates a...
Draw the energy band diagram at equilibrium for the p+ /n/p semiconductor heterostructure (p+ indicates a p-type semiconductor which is heavily doped, i.e., more heavily doped than p). You should indicate Ec (conduction band), Ev (valence band), Ei (intrinsic Fermi level), and Ef (Fermi level) throughout the device structure. show your work (i.e., you should start from the diagram of individual material pieces). State any reason for your drawing.
Use the equations for n and p on page 3 to obtain an expression for the...
Use the equations for n and p on page 3 to
obtain an expression for the intrinsic carrier concentration
ni . HINT: Use the mass action
law: np=n2i.
For a semiconductor material, the number of free electrons per unit volume in the conduction band is given by the expression: and the number of holes per unit volume in the valence band is given by: exp kT where m and mp are the effective masses of the electrons and holes.
A Si p-n-p transistor has impurity concentrations of6*1018, 7 1015 and 9*1017 cm3 in the emitter, base and collector regions correspondingly. The corresponding carrier lifetimes are 10 10-7, and...
A Si p-n-p transistor has impurity concentrations of6*1018, 7 1015 and 9*1017 cm3 in the emitter, base and collector regions correspondingly. The corresponding carrier lifetimes are 10 10-7, and 106 s. The device cross-section area A-0.02 mm2, the emitter base junction is forward biased to 0.7V. Use diffusion coefficients DE-3cm2/s, DB-15 cm2/s, Dc-5cm%, and base with w=0.65 (a) Calculate emitter current using iEp.n-qADpPn p exp( )1 (b) Calculate current gain: (c) Estimate the device switching time (RC) assuming that resistance...
Please help me 1. In degenerate p-type silicon, a. The Fermi energy is above the valence...
Please help me
1. In degenerate p-type silicon, a. The Fermi energy is above the valence energy and below the intrinsic Fermi energy b. The Fermi energy is below the valence energy c. The Fermi energy is above the conduction energy d. The Fermi energy is below the conduction energy and above the intrinsic Fermi energy 2. A semiconductor has No 5X 1010 cm3 and N-2X 1018 cm2. It is a. b. C. d. N-type and electrons are the majority...
Assume that the base of a Si p -n-p transistor is doped with 1016 donors/cm3 and...
Assume that the base of a Si p -n-p transistor is doped with 1016 donors/cm3 and the collector with 1015 acceptors/cm. Find the width of the depletion region on the base side of the collector junction for VCB-2 ? and-10 V. If the base width at equilibrium is 1 ??, s the Early effect for this device significant or not? [Hint: Xao(V-2V) 0.18 um.]
(15 pts) 14. The energy band diagram for an ideal MOS-C under a specific gate bias is shown below...
Please do d e and f
(15 pts) 14. The energy band diagram for an ideal MOS-C under a specific gate bias is shown below. The device is maintained at T 300 K, kTiq 0.026 V, n, 1010 cm Note that E EF at the surface of the semiconductor. Answer the following questions. (d) Determine the surface potential s. (3 pts) EFM 0.24eVEc (e) Determine Dr. (3 pts) E, 0437 ev Ev 0 (a) What biasing mode is this MOS-C...
GaAs laser (a) The degenerate occupation of the conduction and valence bands with electrons and holes...
GaAs laser (a) The degenerate occupation of the conduction and valence bands with electrons and holes helps to maintain the laser requirement that emission must overcome absorption. Explain how the degeneracy prevents band-to-band absorption at the emission wavelength of 867 nm (b) Assuming equal electron and hole concentrations, and same effective masses for electrons and holes, calculate the minimum carrier concentration n -p for population inversion in GaAs at 300 K. The intrinsic carrier concentration at 300 K in GaAs...
1. at what voltage the current density in a p-n diode reaches a magnitude of 10 A/cm^2 ? the diode is made by doping with boron are phosphorous with concentrations of 10^18 and 10^19 cm^-3, respec...
1. at what voltage the current density in a p-n diode
reaches a magnitude of 10 A/cm^2 ? the diode is made by doping with
boron are phosphorous with concentrations of 10^18 and 10^19 cm^-3,
respectively.
3. A MOSFET is made on silicon substrate doped with boron with a concentration of 10" cm. Width and length of channel are 100 and O.1 micron respectively. Thickness of the oxide insulator under the gate is 10 nm. Find transconductance of this transistor...
Assume a p-n step junction in silicon wi concentration of 2x1016,c? and the n-type material doped at 3X10-s,cm3 The intrinsic carrier density is 1.25X101°/cm and all dopants are fully ionized Assume that the effective density of states for silicon is 3.3x10 cm3 for the conduction band and 1.75x101 cm for the valence band. Assume that the temperature is 300K and silicon relative permittivity of 11.7 a. Compute the hole concentration on the n-side and electron concentration th the p-type material...
In a semiconductor it can be shown that the product of the electron and hole densities is the square of the intrinsic density, i.e., pm n. Find the equilibrium electron (n) and hole (p) concentrations and the location of the Fermi level (EF) referenced to the conduction band (Ec) or valence band (Ev) in Si at 27°C if the Si contains the following concentrations of shallow dopant atoms: a) 1x1016 cm-3 boron atoms b) 3x1016 cm-3 arsenic atoms and 2.9x1016...
Use the equations for n and p on page 3 to
obtain an expression for the intrinsic carrier concentration
ni . HINT: Use the mass action
law: np=n2i.
For a semiconductor material, the number of free electrons per unit volume in the conduction band is given by the expression: and the number of holes per unit volume in the valence band is given by: exp kT where m and mp are the effective masses of the electrons and holes.
A Si p-n-p transistor has impurity concentrations of6*1018, 7 1015 and 9*1017 cm3 in the emitter, base and collector regions correspondingly. The corresponding carrier lifetimes are 10 10-7, and 106 s. The device cross-section area A-0.02 mm2, the emitter base junction is forward biased to 0.7V. Use diffusion coefficients DE-3cm2/s, DB-15 cm2/s, Dc-5cm%, and base with w=0.65 (a) Calculate emitter current using iEp.n-qADpPn p exp( )1 (b) Calculate current gain: (c) Estimate the device switching time (RC) assuming that resistance...
Please help me
1. In degenerate p-type silicon, a. The Fermi energy is above the valence energy and below the intrinsic Fermi energy b. The Fermi energy is below the valence energy c. The Fermi energy is above the conduction energy d. The Fermi energy is below the conduction energy and above the intrinsic Fermi energy 2. A semiconductor has No 5X 1010 cm3 and N-2X 1018 cm2. It is a. b. C. d. N-type and electrons are the majority...
Assume that the base of a Si p -n-p transistor is doped with 1016 donors/cm3 and the collector with 1015 acceptors/cm. Find the width of the depletion region on the base side of the collector junction for VCB-2 ? and-10 V. If the base width at equilibrium is 1 ??, s the Early effect for this device significant or not? [Hint: Xao(V-2V) 0.18 um.]
Please do d e and f
(15 pts) 14. The energy band diagram for an ideal MOS-C under a specific gate bias is shown below. The device is maintained at T 300 K, kTiq 0.026 V, n, 1010 cm Note that E EF at the surface of the semiconductor. Answer the following questions. (d) Determine the surface potential s. (3 pts) EFM 0.24eVEc (e) Determine Dr. (3 pts) E, 0437 ev Ev 0 (a) What biasing mode is this MOS-C...
GaAs laser (a) The degenerate occupation of the conduction and valence bands with electrons and holes helps to maintain the laser requirement that emission must overcome absorption. Explain how the degeneracy prevents band-to-band absorption at the emission wavelength of 867 nm (b) Assuming equal electron and hole concentrations, and same effective masses for electrons and holes, calculate the minimum carrier concentration n -p for population inversion in GaAs at 300 K. The intrinsic carrier concentration at 300 K in GaAs...
1. at what voltage the current density in a p-n diode
reaches a magnitude of 10 A/cm^2 ? the diode is made by doping with
boron are phosphorous with concentrations of 10^18 and 10^19 cm^-3,
respectively.
3. A MOSFET is made on silicon substrate doped with boron with a concentration of 10" cm. Width and length of channel are 100 and O.1 micron respectively. Thickness of the oxide insulator under the gate is 10 nm. Find transconductance of this transistor...
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