Solution:
1. In degenartive semiconductor, the fermi lvel isabove the conduction band or beow the valance band.
degenrative means that the doping is very large.
So options (b) and (c) are correct.
2. Semiconductor has Nd>Na,means that the compensated semiconductor is a N- type semiconductor and electrons are themajority carriers.
So options (a) is correct.
3. In intrinsic semicnductor, electrons are in conduction band.
So options (a) is correct.
4. GaAs is a compound semiconductor beacause it is a combination of Ga and As and alsodirect band gap and it can emit photons as light.
So,ptions (d) is correct.
5. In enhanceent mosfet, substrate is p - type and inversion layer exixts for Vg>Vt,
So both are wrong
So options (d) is correct.
6. Unit cell is an arragement of atoms that has a length of unity.
So options (a) is correct.
7. PN junction with no voltage applied means that it remains in equilibruim condition and fermi level is constant and valancy, conduction and intrinsic energy levels bend at the junction interface
So options (d) is correct.
Please help me 1. In degenerate p-type silicon, a. The Fermi energy is above the valence...
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Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped.
Silicon at at T-300 K...
Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped.
Silicon at at T-300 K...
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