In a P-type semiconductor, the Fermi level lies 0.4 ev above the valence band at
300 0K. I)etermine the new position of the Fermi level (a) at 450 OK and (b) if the
concentration of acceptor atoms is multiplied by a factor of 2. Assume kT = 0.03 eV.
In a P-type semiconductor, the Fermi level lies 0.4 ev above the valence band at 300...
P3. (a) Determine the position of the Fermi level with respect to the intrinsic Fermi level in silicon at T = 300'K that is doped with phosphors atoms at a concentration of 1015 cm. (b) Repeat (a) if the silicon is doped with boron atoms at a concentration of 10'5 cm3. (c) Calculate the electron concentration in the silicon for parts (a) and (b) P1. For the Boltzmann approximation to be valid for a semiconductor, the Fermi level must be...
Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped.
Silicon at at T-300 K...
Silicon at at T-300 K contains acceptor atoms at a concentration of Na-5x10A15 cmA-3. Donor atoms are added forming an n type compensated(counter doped) semiconductor such that the fermi level is 0.215 eV below the conduction band edge 4. a. What concentration of donor atoms were added. b. What were the concentration of holes and electrons before the silicon was counterdoped c. What are the electron and hole concentrations after the silicon was counter doped.
Silicon at at T-300 K...
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1. In degenerate p-type silicon, a. The Fermi energy is above the valence energy and below the intrinsic Fermi energy b. The Fermi energy is below the valence energy c. The Fermi energy is above the conduction energy d. The Fermi energy is below the conduction energy and above the intrinsic Fermi energy 2. A semiconductor has No 5X 1010 cm3 and N-2X 1018 cm2. It is a. b. C. d. N-type and electrons are the majority...
Consider a sample of silicon at 300 K in which the Fermi level is found 0.22 eV above the top of the valence band. a) What type of semiconductor is this sample? b) Sketch the band diagram, labelling Ev, E., E. EF, E. – EF, EF - Ec, and Ea or Ed as applicable. c) What is the carrier concentration of electrons and holes in this sample at thermal equilibrium?
Draw the band diagram (the relative positions of conduction band
edge EC, valence band edge Ev, Fermi level EF) for the four
following cases. Clearly note EC −EF, EF −EV, Ei −EF, EG = EC −EV.
Ei is the intrinsic Fermi level. Take NC=NV =1025 m−3, EG=1.1 eV,
ni=1.5×1016 m−3, kT=0.026 eV.
(Q1.1) p-type, NA=5×1023 m−3.
(Q1.2) p-type, NA=5×1021 m−3.
(Q1.3) n-type, ND=5×1023 m−3.
(Q1.4) n-type, ND=5×1021 m−3.
Q2 Draw the band diagram (the relative positions of conduction band edge...
(2) In a semiconductor with an energy gap Eg between the valence and the conduction bands we can take Ef (the Fermi energy) to be halfway between the bands (see figure below): Conduction band Energy gap Eg Valence band Semiconductor a. Show that for a typical semiconductor or insulator at room temperature the Fermi- Dirac factor is approximately equal to exp(-E 2kBT). (Typical Eg for semi-conductors ranges from about 0.5eV to 6eV at T-293K.) b. In heavily doped n-type silicon,...
. Assume that the Fermi-level is 0.13 eV below the conduction band edge, EC. Assume Si (Eg = 1.1 eV) and T = 300 K. Calculate the probability that an electron will occupy a state at EC. Calculate the probability that an electron will occupy a state at EV. Also, calculate the probability that a state at EV will be free of electrons. In this particular case, will the sample be n-type or p-type? Assume that kT=0.025eV at 300K.
Draw the energy band diagram at equilibrium for the p+ /n/p semiconductor heterostructure (p+ indicates a p-type semiconductor which is heavily doped, i.e., more heavily doped than p). You should indicate Ec (conduction band), Ev (valence band), Ei (intrinsic Fermi level), and Ef (Fermi level) throughout the device structure. show your work (i.e., you should start from the diagram of individual material pieces). State any reason for your drawing.
3. Silicon samples with band-gas 1.1 eV at 300 Kelvin, are doped at four different levels and have the properties listed below. Case 1: Case 2: Case 3: Case 4: Ex-Ey = 0.15 eV Ef-Ey=0.88 eV EF-Ey = 0.55 eV Ex-Ey = 1.09 eV The four cases above show the position of the Fermi Level Er relative to the valence band edge Ev.at dilterent doping levels. a) identify each sample as degenerate and nondegenerate. b) which nondegenerate case shows heavy...