a) Holes are injected across a forward biased p-n junction into n region that is much...
Biased Sip-n junction A Si p-n junction with area of 0.001 cm* is formed with an acceptor concentration of Na 1x1015 cm3 on the p-side and a donor concentration of Na- 1x10" cmon the n-side. Calculate at 300 K (a) the diffusion voltage VD (b) the space charge width at equilibrium and with zero bias (c) the current with forward bias of 0.5 eV. Assume that the current is diffusion dominated. The electron and hole mobilities are ln-1500 cm2/(Vs) and...
P3. For an ideal abrupt silicon (Si) P*N diode with doping concentrations Na = 1 x 107 cm3 and N 1 x 105 cm. (a) Find the stored minority carriers density in the N-side neutral region (infinitely long comparing with Lp and Ln) when a forward bias of 1 V is applied. (b) Calculate the hole current density in the region of (a) at x, 0. (Assume the average diffusion length of hole is 5 um the average carrier life...
P3. For an ideal abrupt silicon (Si) P*N diode with doping concentrations Na = 1 x 107 cm3 and N 1 x 105 cm. (a) Find the stored minority carriers density in the N-side neutral region (infinitely long comparing with Lp and Ln) when a forward bias of 1 V is applied. (b) Calculate the hole current density in the region of (a) at x, 0. (Assume the average diffusion length of hole is 5 um the average carrier life...
Problem 3 (25 points) Consider a silicon pn junction at T - 300 K, NA- 1016 cm3, ND-5x1016 cm-3. The minority carrier lifetimes are τα , τ,-1 us. The junction is forward biased with Va-0.5V The minority carrier diffusion coefficients are D 25 cm/s, Da- 10 cm2/s n,1.5x1010 cm3 kT 0.0267 Depletion region p-type n-type a) (5 points) Calculate the excess electron concentration as a function of x in the p-side (see the figure above) b) (10 points) Calculate the...
an-n diode is built with an n region width I smaller than a hole th(l < L). This is the so-called narrow base diode. Since for are injected into a short n region under forward bias, we cannot use the assumption δp(,-o)-0 in Eq. (4-35). Instead, we must use asa the cuiclll iffusion leng his case holes boundary condition the fact that op -0 at x Solve the diffusion equation to obtain (b) Show that the current in the diode...
When you join a p-type semiconductor with an n-type semiconductor to form a p-n junction, holes initially flow from the p-type material into the n-type material, and electrons flow in the opposite direction. Why? a) There is an electric field because of the positive charge in the p-type material and the negative charge in the n-type material. b)Each diffuses into the region where it is at lower concentration. c)The n-type material is at lower potential. d)The n-type material is at...
Calculate the amplitude of current for a p-n junction at 2V forward biased potential. Assume saturation current I 0 = 5x10 -10 A
3. A silicon step junction has uniform impurity doping concentrations of N. 5 x 1015 cm-3 and Nd = 1 x 1015 cm-, and a cross-sectional area of A-|0-4 cm2. Let tao -0.4 s and tpo 0.1 us. Consider the geometry in Figure.Calculate (a) the ideal reverse saturation current due to holes, (b) the ideal reverse saturation current due to electrons, (c) the hole concentration at a, if V V and (d) the electron current at x = x" +...
N P n=10 p=109 1013 4.32P) The figure shows carrier densities of a Si PN junction diode. Before solution choose suitable positive integer values of a and b (a>b) and show this numbers clearly in a box. a) Write the bias type and explain your reason. Calculate the bias voltage. (n=101) b) What are the equilibrium values of minority carriers? c) Calculate the hole concentration on the N side at x=0. d) Diffusion constants of electron and holes has Dn=cDp...
1. Draw the schematics of forward-biased and negative-biased diodes. Show the polarity of voltage source (positive and negative terminal of the source), the position of Fermi levels and the current direction. Explain why there is a small current flow when a p-n junction is under reverse bias. 2. A p-n junction can be made by diffusing acceptor atoms into an n-type semiconductor. Suppose that boron is diffused into a silicon wafer doped with arsenic at 1015 cm-3 such that the...