Question

This is for solid state electronics: Problem 4: Excess electrons and holes are generated at the...

This is for solid state electronics:

Problem 4:
Excess electrons and holes are generated at the end of a Si bar (at x=0).
The Si is homogeneously doped with P atoms to a concentration of 1017 cm-3.
The minority carrier lifetime = 1 μs.
The electron diffusion coefficient = 25 cm2/s
The hole diffusion coefficient = 10 cm2/s
The excess electron and hole concentrations at x=0 are equal to each other and are 1015 cm-3.
(a) Write the formula (with all known numerical values substituted) for the Steady‐state nonequilibrium
minority carrier concentrations in the Si for x>0.
(b) Calculate the steady‐state non‐equilibrium minority carrier concentrations for x=31.6 μm.
(c) Calculate the steady‐state non‐equilibrium minority carrier concentrations for x=1000 μm.
(d) Repeat (b) and (c) to calculate the total steady‐state minority carrier concentrations.


Answers: (b) 3.68x1014 cm‐3s‐1, (c) ≈ 0 cm‐3s‐1, (d) Hint: Determine n0, p0, and remember that n(x)=n0+δn(x) or p(x)=p0+δp(x) .

0 0
Add a comment Improve this question Transcribed image text
Know the answer?
Add Answer to:
This is for solid state electronics: Problem 4: Excess electrons and holes are generated at the...
Your Answer:

Post as a guest

Your Name:

What's your source?

Earn Coins

Coins can be redeemed for fabulous gifts.

Not the answer you're looking for? Ask your own homework help question. Our experts will answer your question WITHIN MINUTES for Free.
Similar Homework Help Questions
  • A “thin” slab (thickness d << 1/α, where α is the absorption coefficient) of GaAs semiconductor...

    A “thin” slab (thickness d << 1/α, where α is the absorption coefficient) of GaAs semiconductor at T = 300 K is uniformly doped with NA = 1016 cm-3 and ND = 0. The GaAs is illuminated with a light source at t = 0 s, resulting in a uniform generation rate of electron hole pairs g’ = 1020 cm-3s-1 through-out the slab of GaAs. The electric field is zero. a) Give the analytic expression for the excess-carrier concentration δn(t)...

  • Problem 3 (25 points) Consider a silicon pn junction at T - 300 K, NA- 1016 cm3, ND-5x1016 cm-3. The minority carrier lifetimes are τα , τ,-1 us. The junction is forward biased with Va-0.5V The minor...

    Problem 3 (25 points) Consider a silicon pn junction at T - 300 K, NA- 1016 cm3, ND-5x1016 cm-3. The minority carrier lifetimes are τα , τ,-1 us. The junction is forward biased with Va-0.5V The minority carrier diffusion coefficients are D 25 cm/s, Da- 10 cm2/s n,1.5x1010 cm3 kT 0.0267 Depletion region p-type n-type a) (5 points) Calculate the excess electron concentration as a function of x in the p-side (see the figure above) b) (10 points) Calculate the...

  • 3. A silicon npn bipolar transistor is uniformly doped and biased in the forward active region wi...

    3. A silicon npn bipolar transistor is uniformly doped and biased in the forward active region with the base-collector junction reverse biased by 2.5 V. The metallurgical base width is 1.5 μm. The emitter, base collector doping concentrations are 5 × 1017, 1016, 2 × 1015 cm-3 respectively. a. At T-300 K, calculate the base-emitter voltage at which the minority carrier electron concentration at x-0 is 20% of the majority carrier hole concentration. At this voltage calculate the minority carrier...

  • Problem 2 (25 points) In a silicon semiconductor, excess carriers are being generated at x -0...

    Problem 2 (25 points) In a silicon semiconductor, excess carriers are being generated at x -0 as shown below. Assume NA 2x1015 cm3, N 0. The excess carrier concentration at x-0 is 1013 cm3 and the excess carrier concentration at x = Ln is 0 (Ln ls the electron diffusion length). lụs, are D,-25 cm2/s, D,-10 cm2/s. Assume the electric field is zero, ta T = 300K. ķT1e = 0.026V. tp Light NA 2x1015 cm3 a) (15 points) Write the...

  • 3. A silicon step junction has uniform impurity doping concentrations of N. 5 x 1015 cm-3 and Nd ...

    3. A silicon step junction has uniform impurity doping concentrations of N. 5 x 1015 cm-3 and Nd = 1 x 1015 cm-, and a cross-sectional area of A-|0-4 cm2. Let tao -0.4 s and tpo 0.1 us. Consider the geometry in Figure.Calculate (a) the ideal reverse saturation current due to holes, (b) the ideal reverse saturation current due to electrons, (c) the hole concentration at a, if V V and (d) the electron current at x = x" +...

  • Problem 4 (25 points) Consider a silicon pn junction at T-300 K, NA-ND- 1x101° cm3. The minority ...

    Problem 4 (25 points) Consider a silicon pn junction at T-300 K, NA-ND- 1x101° cm3. The minority carrier lifetimes are τ n-0.01 μs and τ p-0.01 us. The junction is forwardbiased with Va 0.6V. The minority carrier diffusion coefficients are Dn-20 cm s, Dp 10 cm Is. n.-1.5x 1010 cm-3 Depletion region n-type p-type a) (10 points) Calculate the excess electron concentration as a function of x in the p side (see the figure above). b) (5 points) Calculate the...

  • Problem 4 (25 points) Consider a silicon pn junction at T 300 K, NA ND-1x1016 cm3....

    Problem 4 (25 points) Consider a silicon pn junction at T 300 K, NA ND-1x1016 cm3. The minority carrier lifetimes are τ -0.01 μs and τΡ 0.01 μ. The Junction is forwardbiased with , V,-0.6V. The minority carrier diffusion coefficients are D,-20 cm2/s, D,-10 cm2/s. n, = 1.5x 1010cm -3 Depletion region n-type p-type a) (10 points) Calculate the excess electron concentration as a function of x in the p side (see the figure above). b) (5 points) Calculate the...

  • 2. A GaAs semiconductor at T 300 K is uniformly doped with NA 1016 cm3 and...

    2. A GaAs semiconductor at T 300 K is uniformly doped with NA 1016 cm3 and No 0. The GaAs is illuminated with a light source at t = 0 s, resulting in a uniform generation rate of electron hole pairs g' 1020 cm . The electric field is zero. a) Give the analytic expression for the excess-carrier concentration δn(t) versus the time t>0s b) The steady state excess carrier concentration is found to be on( is the minority carrier...

  • this is a problem of semiconductor device and fundamentals. Problem 4: pn Junction Current Distributions Consider a...

    this is a problem of semiconductor device and fundamentals. Problem 4: pn Junction Current Distributions Consider a Si pn step junction diode maintained at room temperature, with p-side and n-side dopant concentrations NA 1016 cm3 and Np-2x1016 cm3, respectively. (You may assume that each side is uncompensated.) The minority carrier recombination lifetimes are τ,-10-6 s and τ,-10-7 s on the p-side and n-side, respectively a) Calculate the minority carrier densities at the edges of the depletion region when the applied...

  • Problem 4 (25 points) Consider a silicon pn junction at T-300 K, NA-ND- 1x101° cm3. The minority ...

    Can someone help solve this question step by step? Thanks! Problem 4 (25 points) Consider a silicon pn junction at T-300 K, NA-ND- 1x101° cm3. The minority carrier lifetimes are τ n-0.01 μs and τ p-0.01 us. The junction is forwardbiased with Va 0.6V. The minority carrier diffusion coefficients are Dn-20 cm s, Dp 10 cm Is. n.-1.5x 1010 cm-3 Depletion region n-type p-type a) (10 points) Calculate the excess electron concentration as a function of x in the p...

ADVERTISEMENT
Free Homework Help App
Download From Google Play
Scan Your Homework
to Get Instant Free Answers
Need Online Homework Help?
Ask a Question
Get Answers For Free
Most questions answered within 3 hours.
ADVERTISEMENT
ADVERTISEMENT
ADVERTISEMENT