Problem 4: Schottky Diode-Small-Signal Capacitance Consider the following reverse-bias capacitanc...
Problem 1: Schottky Diode Small-Signal Capacitance Consider the measured reverse-bias capacitance data in Figure 14.8b of Pierret, reproduced below 1/c2 4 103 3. Pp2 -12 10 8 6 4 VA (volts) Illustrate with simple quantitative sketches how the measured curve would change if a) the Schottky barrier Dn decreases to 0.5 eV (but the semiconductor doping concentration remains N-1x1016 em) b) the semiconductor doping concentration Np increases to 1x1017 cm3 (but the Schottky barrier remains 0.8 eV) Problem 1: Schottky...
Materials Science/Electronic Circuits Parts a and b please Depletion-Layer Analysis for Schottky 4.20 (a) Calculate the small signal capacitance at zero bias and 300 K for an ideal Schottky Diodes barrier [see Eq. (4,16.2)] between platinum (work function 5,3 ev) and silicon doped with Nd 101°cm. The area of the Schottky diode is 10c (b) Calculate the reverse bias at which the capacitance is reduced by 25% from its zero- bias value. (4.16.2) Depletion-Layer Analysis for Schottky 4.20 (a) Calculate...
3. (40 pts) The capacitance of a silicon pn junction diode with an area 10° cm2 is measured. A plot of 1/C2 vs. the applied voltage Va is shown. The dashed line is extrapolated, continuing the data with a constant slope. From the junction capacitance formula and the dependence of W on Vbi-VA, one can obtain an equation for 1/C (a) If the diode is a one-sided junction, find the doping density on the low side from the measured (estimate...
Problem 3: MS contact -Vcharacteristics A Schottky diode maintained at T 300K is formed between TiSiz and silicon doped with 101 cm3 phosphorus. The cross-sectional area is 100 μm 100pm-104 cm, a) Determine the reverse saturation current Is, using the measured value of Schottky barrier height given in Lecture Note. Recall from Lecture Note that the conductivity effective masses for electrons and holes in silicon are 0.26mo and 0.39mo, respectively b) Plot the forward-bias diode I-Vcharacteristic on a log-linear scale...
Consider a gold-GaAs Schottky diode with a capacitance of 1 pF at -1 V. What is the doping density of the GaAs? Also calculate the depletion layer width at zero bias and the field at the surface of the semiconductor at -10 V bias voltage. The area of the diode is 10-5 cm2. Design a platinum-silicon diode with a capacitance of 1 pF and a maximum electric field less than 104 V/cm at -10 V bias. Provide a possible doping...
A silicon PN junction diode is constructed using N-type silicon in which the Fermi level is 100 meV below the conduction band edge and P-type silicon in which the Fermi level is 120 meV above the valence band edge a) What are the majority and minority carrier concentrations on each side of the junction under thermal equilibrium? b) What is the value of the built-in voltage? c) Determine the width of the depletion region on both sides of the junction...
Please answer question 2 part c 2. The following table is the reverse bias capacitance of a p+-n step junction diode. If the area of the diode is 1 x 10-2cmand the semiconductor is uniformly doped, calculate the following assuming the relative dielectric constant of the semiconductor is Ks = 10, E = 8.854 x 10-14 F/cm, 1pF=10-12F, and the plot of +2 versus V is straight line. Voltage (V) Capacitance (PF) 420 344 298 266 243 5 - (a)...
1. A metal/n-GaAs Schottky Barrier is formed by depositing platinum on n-GaAs. The electron affinity of GaAs is 4.0 eV. The work function of Pt is 5.0 eV. The doping in GaAs is 1E16/cm3, and Nc=5E17/cm3. i) Draw the thermal equilibrium energy band diagram for the structure ii) Calculate the barrier height and the built-in voltage iii) Calculate the depletion width in GaAs, given ε(total) for GaAs=1E-12 F/cm --> w=sqrt((2*ε*Vbi)/(q*ND)) iv) Calculate the depletion capacitance for 1 cm2 area v)...
For an abrupt p-n junction of Area = 10-4 cm2, the measured capacitance under reverse bias of 20 V is 12 pF/cm2. Calculate the donor concentration.
Problem 4: Narrow-Base Diode Consider an ideal pn* step-junction Si diode maintained at 300K with cross-sectional area A = 104cm2. The doping concentration on the p-type side is Na= 1017 cm3 (uncompensated). (The n-type side is degenerately doped.) The electron recombination lifetime in the p-type region is tn = 10-6 s. The width of the quasi-neutral p-type region is 1 um, for VA=0 V. a Is this a narrow-base diode? Justify your answer. b) Calculate the diode saturation current Io....