PIN Diode In PIN diode the i region is sandwiched between the p and n region as shown in Fig 11.5
The i-region is either a high resistivity layer. PIN diodes are fabricated by -epitaxial process -Diffusion of p and n in high resistability substrate -ion drift method The concentration, charge density and electric field profiles are shown in Fig 11.6
PIN diodes are used widely in microwave wave circuits such as microwave switch with constant depletion layer and high power. The switching speed Where W is the total depletion region width and is the saturation velocity across i region. In addition the PIN diode can be used as -variable attenuator by varying device resistance that change approximately likely with forward current -Modulate signals up to GHz range. -Photo detection of internal modulated light in reverse bias. Under Riverse Bias the junction capacitance is and the series resistance is Where is the i-region resistance and is the contact resistance. The reverse bias current is Where is the ambipolar life time. The I-V characteristics is shown in Fig 11.7 |
In a p-i-n diode shown below, the doping concentration of p region is slightly larger than n' region and the wide i region is 1-11 undoped P+ N+ -X (a) Sketch the space-charge distribution (b) Sk...
1. Consider a p-n junction diode with doping concentrations: NA6.5x1015 cm3 and ND 107 cm3 in the p- and n-sides, respectively. (a) Calculate the free electron and hole concentrations in both p- and n-sides' neutral regions. (b) Find the barrier height and the built-in voltage. (c) Sketch the energy band diagram of the complete p-n junction. Mark all energy levels including the barrier height and show the energy level values. (d) Calculate the total depletion width under zero bias. (e)...
5. Sketch the energy band diagram for a p'-n step junction diode at: (a) thermal equilibrium; (b) forward bias (show with respect to thermal equilibrium) (c) reverse bias (show with respect to thermal equilibrium) (d) in part (a) sketch a new diagram showing the carrier flux and the four current components with respect to each other.
P3. For an ideal abrupt silicon (Si) P*N diode with doping concentrations Na = 1 x 107 cm3 and N 1 x 105 cm. (a) Find the stored minority carriers density in the N-side neutral region (infinitely long comparing with Lp and Ln) when a forward bias of 1 V is applied. (b) Calculate the hole current density in the region of (a) at x, 0. (Assume the average diffusion length of hole is 5 um the average carrier life...
P3. For an ideal abrupt silicon (Si) P*N diode with doping concentrations Na = 1 x 107 cm3 and N 1 x 105 cm. (a) Find the stored minority carriers density in the N-side neutral region (infinitely long comparing with Lp and Ln) when a forward bias of 1 V is applied. (b) Calculate the hole current density in the region of (a) at x, 0. (Assume the average diffusion length of hole is 5 um the average carrier life...
A silicon PN junction diode is constructed using N-type silicon in which the Fermi level is 100 meV below the conduction band edge and P-type silicon in which the Fermi level is 120 meV above the valence band edge a) What are the majority and minority carrier concentrations on each side of the junction under thermal equilibrium? b) What is the value of the built-in voltage? c) Determine the width of the depletion region on both sides of the junction...
a3. (a) Draw a band diagram and a cross-sectional diagram of an abrupt p-n junction0Marks] with N>N at thermal equilibrium at 300K and label the following: () Diffusion currents, (i) Drift currents (ii) Fermi level, (iv) SCR, (v) QNR, (vi) Contact potential with polarity, (vi) Electric field distribution in the SCR, (vii) Electrostatic potential distribution in SCR, (ix) SCR charges, and (x) SCR penetration into the p-and n sides. (b) In a p'-n junction at 300K, the n side has...
Taking pure silicon (Si) as an example, explain what is meant by the terms electron-hole generation and recombination, how they affect the electrical conductivity, and define what is meant by the "intrinsic carrier density", n. [5 marks] Q3. a) b) With the aid of both lattice and energy band diagrams, explain how n-type doping of Si is achieved and state two types of suitable dopant atoms. [7 marks] c) An n-type region on a Si wafer has a donor concentration...
A common source amplifier circuit based on a single n-channel MOSFET is shown in Figure 4b. Assume that the transconductance gm-60 mS (equivalent to mA/ V) and drain source resistance, os, is so large it may be neglected. 0) Calculate the open circuit voltage gain Av Yout/ Vis. i) The amplifier has a load of 10 k2. Determine the current gain Va. = 12 V 150k 4k3 Vout Vin 200k GND = 0 V Figure 4b a) State the name...