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2. Suppose you have a silicon wafer containing a p n junction. Design the doping level on the n-side so that the rev...
A p-n junction is created by doping the right side of a piece of silicon with...
A p-n junction is created by doping the right side of a piece of silicon with 1014 atoms/cm3 of phosphorus and the left side with 1018 atoms/cm3 of boron. Assume that the dopants are fully ionized, and assume the junction is at x = 0 with x+ pointed to the right. a) Plot by hand (roughly to scale) an energy band diagram of the junction and label EGAP, EC, EV, EF and EFi. Using the effective density of states, calculate...
2. (60 pts) Consider a one-sided silicon PN diode. The p-side is degenerately doped (and you...
2. (60 pts) Consider a one-sided silicon PN diode. The p-side is degenerately doped (and you can assume Ep = Ey for simplicity). The doping concentration on the n-side is Np for 0<x <too. The depletion width on the n-side is xn. Use the depletion approximation. p* ND x 0 From here, you assume that Np is given by 4x1015 cm. (h) (7 pts) What is the maximum electric field in depletion region when Va=-3 V? (i) (8 pts) As...
1. Consider a p-n junction diode with doping concentrations: NA6.5x1015 cm3 and ND 107 cm3 in...
1. Consider a p-n junction diode with doping concentrations: NA6.5x1015 cm3 and ND 107 cm3 in the p- and n-sides, respectively. (a) Calculate the free electron and hole concentrations in both p- and n-sides' neutral regions. (b) Find the barrier height and the built-in voltage. (c) Sketch the energy band diagram of the complete p-n junction. Mark all energy levels including the barrier height and show the energy level values. (d) Calculate the total depletion width under zero bias. (e)...
THE REVERSE BIAS VOLTAGE APPLIED TO SILICON PN JUNCTION DIODE IS 4V, DOPING CONCENTRATION Na is...
THE REVERSE BIAS VOLTAGE APPLIED TO SILICON PN JUNCTION DIODE IS 4V, DOPING CONCENTRATION Na is 10^17 cm^-3, Nd = 10^16 cm^-3, ni = 1.3 x 10^9 cm^-3, temperature T = 273 k find the width of depletion region with the applied reverse voltage please check your answer that it is correct please it is a humble request
6. (14) A silicon wafer (Si: ni=10cm-3 and Er=11 ) is used to make a PN...
6. (14) A silicon wafer (Si: ni=10cm-3 and Er=11 ) is used to
make a PN junction over a circular area with a diameter r=1mm.
) A silicon wafer (Si: n = 100cm 3 and ε = 11) is used to make a PN junction over a circular area with a diameter r=1 mm. Aluminum is used as a p-type dopant with density of 101cm), and Arsenic as an n-type dopant with density of 10'5cm3. (a) (4) Find the Fermi...
4. AP-N abrupt junction is formed in Silicon as follows: The P-side has a uniform acceptor...
4. AP-N abrupt junction is formed in Silicon as follows: The P-side has a uniform acceptor concentration of 2E18/cm^3 and the N-side has a uniform donor concentration of 2E15/cm^3. (a) Find the built-in voltage, V of the P-N junction at 300K. (b) Find the width of the depletion regions in the P and N regions of the transition region for zero reverse bias and for 5V reverse bias. (c) What is the depletion capacitance per unit area with zero reverse...
(iv) [2 Marks] A pn-junction has a built-in potential voltage of 1V across the junction. The width of the depletion reg...
(iv) [2 Marks] A pn-junction has a built-in potential voltage of 1V across the junction. The width of the depletion region is 1um. The acceptor doping is NA 2 x 1015cm-3 in the P-side and a donor doping is Np = 8 x 1015cm-3 on the N-side. If the reference position x 0 is the edge of the depletion region on the P-side and the P region is on the left of the N region then where does the maximum...
A silicon p-n junction is made by doping the p and n sides with doping density...
A silicon p-n junction is made by doping the p and n sides with doping density of Na=3E15 cm and Nd=2E18 cm". At T=300 K in equilibrium find: e) Draw the energy diagram inclusive of Xn, Xp, energy and fermi levels
Design a silicon pn junction by finding the ratio of the impurity
Design a silicon pn junction by finding the ratio of the
impurity
n junction by finding the ratio of the impurity concentrations Na e p-n junction to be designed is assumed to have ideal current-voltage (12 pts) N D Design a silic such that 95 percent elect 2. A. cent of the total current in the depletion region is contributed by rons. Th In addition, it has the following parameter values τ,-τ,-0.1 x 10-6 s, D,-10 cm2/s and D,-25 cm2/s...
Problem 4: An abrupt silicon p-n junction diode has the following characteristics. side n-side N-4x 1016cm N1016cm3 n 1000 cm2/V sec 350 cm2/V sec Area A 102cm2 Calculate the following quantities...
Problem 4: An abrupt silicon p-n junction diode has the following characteristics. side n-side N-4x 1016cm N1016cm3 n 1000 cm2/V sec 350 cm2/V sec Area A 102cm2 Calculate the following quantities: (a) Reverse saturation hole current component (b) Reverse saturation electron current component. (c) Minority carrier concentrations at the edge of the depletion layer, p(0) and pr(0), for a forward voltage of 0.6 V (d) Electron and hole current for the bias condition of (c). (e) Make a rough sketch...
2. (60 pts) Consider a one-sided silicon PN diode. The p-side is degenerately doped (and you can assume Ep = Ey for simplicity). The doping concentration on the n-side is Np for 0<x <too. The depletion width on the n-side is xn. Use the depletion approximation. p* ND x 0 From here, you assume that Np is given by 4x1015 cm. (h) (7 pts) What is the maximum electric field in depletion region when Va=-3 V? (i) (8 pts) As...
1. Consider a p-n junction diode with doping concentrations: NA6.5x1015 cm3 and ND 107 cm3 in the p- and n-sides, respectively. (a) Calculate the free electron and hole concentrations in both p- and n-sides' neutral regions. (b) Find the barrier height and the built-in voltage. (c) Sketch the energy band diagram of the complete p-n junction. Mark all energy levels including the barrier height and show the energy level values. (d) Calculate the total depletion width under zero bias. (e)...
6. (14) A silicon wafer (Si: ni=10cm-3 and Er=11 ) is used to
make a PN junction over a circular area with a diameter r=1mm.
) A silicon wafer (Si: n = 100cm 3 and ε = 11) is used to make a PN junction over a circular area with a diameter r=1 mm. Aluminum is used as a p-type dopant with density of 101cm), and Arsenic as an n-type dopant with density of 10'5cm3. (a) (4) Find the Fermi...
4. AP-N abrupt junction is formed in Silicon as follows: The P-side has a uniform acceptor concentration of 2E18/cm^3 and the N-side has a uniform donor concentration of 2E15/cm^3. (a) Find the built-in voltage, V of the P-N junction at 300K. (b) Find the width of the depletion regions in the P and N regions of the transition region for zero reverse bias and for 5V reverse bias. (c) What is the depletion capacitance per unit area with zero reverse...
(iv) [2 Marks] A pn-junction has a built-in potential voltage of 1V across the junction. The width of the depletion region is 1um. The acceptor doping is NA 2 x 1015cm-3 in the P-side and a donor doping is Np = 8 x 1015cm-3 on the N-side. If the reference position x 0 is the edge of the depletion region on the P-side and the P region is on the left of the N region then where does the maximum...
A silicon p-n junction is made by doping the p and n sides with doping density of Na=3E15 cm and Nd=2E18 cm". At T=300 K in equilibrium find: e) Draw the energy diagram inclusive of Xn, Xp, energy and fermi levels
Design a silicon pn junction by finding the ratio of the
impurity
n junction by finding the ratio of the impurity concentrations Na e p-n junction to be designed is assumed to have ideal current-voltage (12 pts) N D Design a silic such that 95 percent elect 2. A. cent of the total current in the depletion region is contributed by rons. Th In addition, it has the following parameter values τ,-τ,-0.1 x 10-6 s, D,-10 cm2/s and D,-25 cm2/s...
Problem 4: An abrupt silicon p-n junction diode has the following characteristics. side n-side N-4x 1016cm N1016cm3 n 1000 cm2/V sec 350 cm2/V sec Area A 102cm2 Calculate the following quantities: (a) Reverse saturation hole current component (b) Reverse saturation electron current component. (c) Minority carrier concentrations at the edge of the depletion layer, p(0) and pr(0), for a forward voltage of 0.6 V (d) Electron and hole current for the bias condition of (c). (e) Make a rough sketch...
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