A photoconductive cell is made from GaAs doped with donors at a level of 2 × 1011 cm-3 and operated at 300K. The thickness of the cell is 10−4cm, its width 1.5 cm and length (the dimension parallel to current flow) 0.2 cm. The device is operated under light and dark conditions.
a)Calculate the conductivity and resistance of the cell under dark conditions.
c)Under light conditions, calculate the electron and hole concentrations required in the cell to produce a cell resistance of 200 Ω assuming the electron and hole recombination times are 10−4 s.
e) Calculate the optical generation rate corresponding to part (c).
Solutions: 1a) 4.52 MΩ c) 4.37E15 cm-3 e) 4.37E19 cm-3s-1
A photoconductive cell is made from GaAs doped with donors at a level of 2 ×...
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