semiconductor class， need right answer pls
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semiconductor class， need right answer pls
7.1 Assume that the gate oxide between an n+ poly-Si...
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl =...
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl = 1.5 x 1010 cm3 Co [Farads] 3.45x1011 >Va [Volts] 1.0 0.3 (a) Is the semiconductor (silicon) substrate doped n-type or p-type? Explain briefly. (b) Is the measurement frequency low or high? Explain briefly. (c) What is the thickness of the gate oxide (SiO2), xo? (d) Estimate the...
3. For an n-channel MOSFET with gate oxide (SiO2) thickness of 30 nm, threshold voltage of 0.7 V,...
3. For an n-channel MOSFET with gate oxide (SiO2) thickness of 30 nm, threshold voltage of 0.7 V, Z = 30 um, and length of the device is 0.9 μm, calculate the drain current for VG-3 V and VD-0.2 V. Assume that the electron channel mobility is 200 cm'/V-sec. What will be the required drain current to drive the MOS in saturation region? How the drain current will change if HfO2 with Ks 25 will be used as a gate...
Problem 3: Consider a MOS capacitor maintained at T= 300K with the following characteristics: Assume s 11.9, ox 3.9, 8.85x 10-1 F/cm, and n 1.5 x 1010cm3 Gate material is n poly-silicon Total...
Problem 3: Consider a MOS capacitor maintained at T= 300K with the following characteristics: Assume s 11.9, ox 3.9, 8.85x 10-1 F/cm, and n 1.5 x 1010cm3 Gate material is n poly-silicon Total negative oxide charge of 5x 1011q C/cm . Substrate is n-type Si, with doping concentration 1 x1016 cm-3 Oxide thickness 5 nmm The electron affinity for Si is 4.03eV? e) What is the flat capacitance? f) What is the depletion region width? g) What is the potential...
Problem 6: The energy band diagram for an ideal MOS-capacitor is shown below. tx 0.2 μm and Ep = E, at the Si-SiO2 interface. Assume no oxide charge and φ'm5-0. Answer the following. EpM Eps T...
Problem 6: The energy band diagram for an ideal MOS-capacitor is shown below. tx 0.2 μm and Ep = E, at the Si-SiO2 interface. Assume no oxide charge and φ'm5-0. Answer the following. EpM Eps Toz9ev 055ev a) What is the numerical value of the electron concentration at the Si-SiO2 interface? b) What is the substrate doping type and concentration? c) What is the electrostatic potential at the Si-SiO2 interface? d) What would be the depletion depth (width)? e) What...
An n-channel Sí MOSFET (ni-1.5 1010 cm-3 ,er-11.8) with 50 nm thick HfO2 high- K dielectric...
An n-channel Sí MOSFET (ni-1.5 1010 cm-3 ,er-11.8) with 50 nm thick HfO2 high- K dielectric (Er-25). The device width is W-10 m wide. The distance between the source and drain is L 0.5 μm long. The diffusion constant of the minority carriers in the channel at room temperature is 25 cm2/s. The n+ poly-Si gate is doped with Np 1020 cm-3 donors. This MOSFET is designed to have a threshold voltage of Vt 0.5 V. A gate-source voltage of...
Problem 1: The MOSFET as a Resistor Consider an n -poly-Si-gated long-channel n-MOSFET with WIL- 10,...
Problem 1: The MOSFET as a Resistor Consider an n -poly-Si-gated long-channel n-MOSFET with WIL- 10, effective gate- oxide thickness Toxe 2 nm, and substrate (body) dopant concentration NA- 1018 cm3: (a) Calculate the gate-to-source voltage VGs required for the MOSFET to present a resistance of 1 kΩ between the source and drain at low values of VDS. (Hint: You will need to solve this problem iteratively when you consider the dependence of effective mobility leff on the effective vertical...
Calculate Vrofa Si n-channel MOSFET with @ms =-0.25 V, 100 nm gate oxide thickness, NA =...
Calculate Vrofa Si n-channel MOSFET with @ms =-0.25 V, 100 nm gate oxide thickness, NA = 1017 /cm, and oxide charge density 5 x 1018 C/cm2 for a substrate bias of -2 V. (QD = 6x10-8 C/cm) If the channel mobility is un = 250 cm-/V-sec, then what will be the drive current for a 50-nm channel MOSFET with gate bias at 2 V working at satu- ration region? The length of the MOSFET is 2 um.
5. You are given a MOSFET biased as shown in the figure. i) Sketch the drain current Ip when Vo is ramped up fro...
5. You are given a MOSFET biased as shown in the figure. i) Sketch the drain current Ip when Vo is ramped up from 0V to 3 V in a log scale. log(ID ↑ I, 2 0 ) The MOSFET has switched through different operation regions (inear, saturation, subthreshold) during the ramp-up ii) The MOSFET has swit Label the different regions in the graph as you plot the curve above. iii) In dicate the values Vo's that mark the different...
Problem3: Consider a MOS capacitor maintained at T 300K with the following characteristics: Assume Esi 1.9,x 3.9,8.85 x 10-14 F/cm, and n 1.5 x 1010cm3 . Gate material is n+ poly-silicon . Total n...
Problem3: Consider a MOS capacitor maintained at T 300K with the following characteristics: Assume Esi 1.9,x 3.9,8.85 x 10-14 F/cm, and n 1.5 x 1010cm3 . Gate material is n+ poly-silicon . Total negative oxide charge of 5x 1011q C/cnm2 . Substrate is n-type Si, with doping concentration 1x1016 cm3 Oxide thickness 5 nm . The electron affinity for Si is 4.03eV? a) Draw the band diagram at equilibrium. b) From part (a). What is the substrate (bulk) condition at...
Determine the maximum width of the depletion region, Wmax?? An n-channel metal-SiO2-Si MOSFET has the following parameters: 16 ст.3 NA = 4x 101 μη-I 000 cmr/(V.sec ) Фт.--0.925 eV, Gate oxide thickne...
Determine the maximum width of the depletion region,
Wmax??
An n-channel metal-SiO2-Si MOSFET has the following parameters: 16 ст.3 NA = 4x 101 μη-I 000 cmr/(V.sec ) Фт.--0.925 eV, Gate oxide thickness tox-d= 3.0x10-6 cm Dimensions: L = 0.5x10-4 cm, Z = 1 x 104 cm Oxide Charges: Qs = 4.8x 10-8 Coul/cm, Qm= Q,-Qu = 0, Assume -9.65x10 cm3,T-300 K and KT-0.0259 eV cm . .
An n-channel metal-SiO2-Si MOSFET has the following parameters: 16 ст.3 NA = 4x...
Problem 5: The gate capacitance vs. gate voltage characteristic of a p+ poly-Si gated MOS capacitor of area 1x10"cm', is as shown: Assume Esi = 11.9, Eox-39,E,-8.85 × 10-14 F/on, and nl = 1.5 x 1010 cm3 Co [Farads] 3.45x1011 >Va [Volts] 1.0 0.3 (a) Is the semiconductor (silicon) substrate doped n-type or p-type? Explain briefly. (b) Is the measurement frequency low or high? Explain briefly. (c) What is the thickness of the gate oxide (SiO2), xo? (d) Estimate the...
3. For an n-channel MOSFET with gate oxide (SiO2) thickness of 30 nm, threshold voltage of 0.7 V, Z = 30 um, and length of the device is 0.9 μm, calculate the drain current for VG-3 V and VD-0.2 V. Assume that the electron channel mobility is 200 cm'/V-sec. What will be the required drain current to drive the MOS in saturation region? How the drain current will change if HfO2 with Ks 25 will be used as a gate...
Problem 3: Consider a MOS capacitor maintained at T= 300K with the following characteristics: Assume s 11.9, ox 3.9, 8.85x 10-1 F/cm, and n 1.5 x 1010cm3 Gate material is n poly-silicon Total negative oxide charge of 5x 1011q C/cm . Substrate is n-type Si, with doping concentration 1 x1016 cm-3 Oxide thickness 5 nmm The electron affinity for Si is 4.03eV? e) What is the flat capacitance? f) What is the depletion region width? g) What is the potential...
Problem 6: The energy band diagram for an ideal MOS-capacitor is shown below. tx 0.2 μm and Ep = E, at the Si-SiO2 interface. Assume no oxide charge and φ'm5-0. Answer the following. EpM Eps Toz9ev 055ev a) What is the numerical value of the electron concentration at the Si-SiO2 interface? b) What is the substrate doping type and concentration? c) What is the electrostatic potential at the Si-SiO2 interface? d) What would be the depletion depth (width)? e) What...
An n-channel Sí MOSFET (ni-1.5 1010 cm-3 ,er-11.8) with 50 nm thick HfO2 high- K dielectric (Er-25). The device width is W-10 m wide. The distance between the source and drain is L 0.5 μm long. The diffusion constant of the minority carriers in the channel at room temperature is 25 cm2/s. The n+ poly-Si gate is doped with Np 1020 cm-3 donors. This MOSFET is designed to have a threshold voltage of Vt 0.5 V. A gate-source voltage of...
Problem 1: The MOSFET as a Resistor Consider an n -poly-Si-gated long-channel n-MOSFET with WIL- 10, effective gate- oxide thickness Toxe 2 nm, and substrate (body) dopant concentration NA- 1018 cm3: (a) Calculate the gate-to-source voltage VGs required for the MOSFET to present a resistance of 1 kΩ between the source and drain at low values of VDS. (Hint: You will need to solve this problem iteratively when you consider the dependence of effective mobility leff on the effective vertical...
Calculate Vrofa Si n-channel MOSFET with @ms =-0.25 V, 100 nm gate oxide thickness, NA = 1017 /cm, and oxide charge density 5 x 1018 C/cm2 for a substrate bias of -2 V. (QD = 6x10-8 C/cm) If the channel mobility is un = 250 cm-/V-sec, then what will be the drive current for a 50-nm channel MOSFET with gate bias at 2 V working at satu- ration region? The length of the MOSFET is 2 um.
5. You are given a MOSFET biased as shown in the figure. i) Sketch the drain current Ip when Vo is ramped up from 0V to 3 V in a log scale. log(ID ↑ I, 2 0 ) The MOSFET has switched through different operation regions (inear, saturation, subthreshold) during the ramp-up ii) The MOSFET has swit Label the different regions in the graph as you plot the curve above. iii) In dicate the values Vo's that mark the different...
Problem3: Consider a MOS capacitor maintained at T 300K with the following characteristics: Assume Esi 1.9,x 3.9,8.85 x 10-14 F/cm, and n 1.5 x 1010cm3 . Gate material is n+ poly-silicon . Total negative oxide charge of 5x 1011q C/cnm2 . Substrate is n-type Si, with doping concentration 1x1016 cm3 Oxide thickness 5 nm . The electron affinity for Si is 4.03eV? a) Draw the band diagram at equilibrium. b) From part (a). What is the substrate (bulk) condition at...
Determine the maximum width of the depletion region,
Wmax??
An n-channel metal-SiO2-Si MOSFET has the following parameters: 16 ст.3 NA = 4x 101 μη-I 000 cmr/(V.sec ) Фт.--0.925 eV, Gate oxide thickness tox-d= 3.0x10-6 cm Dimensions: L = 0.5x10-4 cm, Z = 1 x 104 cm Oxide Charges: Qs = 4.8x 10-8 Coul/cm, Qm= Q,-Qu = 0, Assume -9.65x10 cm3,T-300 K and KT-0.0259 eV cm . .
An n-channel metal-SiO2-Si MOSFET has the following parameters: 16 ст.3 NA = 4x...
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