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consider a region of silicon at 300k where the carrier concentrations are: n(x)=2x10^17 cm^-3 p(x)=A(x-xL)^2 cm^-3...

consider a region of silicon at 300k where the carrier concentrations are:
n(x)=2x10^17 cm^-3
p(x)=A(x-xL)^2 cm^-3
where A= 1x10^22 cm^-5 and xL= 10 um
it is known that the current density J is equal to 50 A/cm^2. the material parameters are under =1350, Dn=35, up=480, Dp=12.4 in units of cm^2/V-s and cm^2/s.
you may neglect hole drift current in your approx analysis.
a. jp(x)
b. jn(x)
c. E(x)

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Answer #1

2xid P AC1- Cn Cun p4g0Cmns Dp 12-4 Cus Dn 35CmA Len 1350cmfu-s a) pCa) Vop 2AC- -17 ニー6メIO メ124x2X10 (a -lo A +39-6x 104-10)

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