Consider a junction between highly-doped n-type Si (n+ doping of 6*1018cm-3 and weakly doped n-Type Si...
Consider a junction between highly-doped n-type Si (n+ doping of 6*1018cm-3 and weakly doped n-Type Si n+ doping of 1*1015cm-3) .
Plot the bands and Fermi levels.
Now do the same assuming the doping is graded over the distance L.
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Consider a junction between highly-doped n-type Si (n+ doping of
6*1018cm-3 and weakly doped n-Type Si...
Consider an abrupt p-n junction consisted of a p-side silicon doped with 1.0E+15 cm-3 acceptors and...
Consider an abrupt p-n junction consisted of a p-side silicon doped with 1.0E+15 cm-3 acceptors and an n- side silicon doped with 1.0E+15 cm-3 donors at room temperature (no donors in p-side and no acceptors in n-side). a. Calculate the Fermi levels on each side of the junction with respect to Ei. Use the Special Conditions to find the concentrations. b. Calculate the contact potential. c .Calculate the ratio, Xpo/Xno
3.13 Si pn junction Consider a long pn junction diode with an acceptor doping Naof 1018 cm-3 on t...
3.13 Si pn junction Consider a long pn junction diode with an acceptor doping Naof 1018 cm-3 on the p-side and donor concentration of Nj on the n-side. The diode is forward biased and has a voltage of 0.6 V across it. The diode cross-sectional area is 1 mm2. The minority carrier recombination time, T, depends on the total dopant concentration, Ndopant (cm), through the following approximate empirical relation (5x 10-7)/(1 + 2 10-17N1°pan.) where T is in seconds. (a)...
An ideal metal-semiconductor (M-S) junction is formed on the n-type Si semiconductor that is uniformly doped...
An ideal metal-semiconductor (M-S) junction is formed on the n-type Si semiconductor that is uniformly doped with a donor impurity (phosphorus) concentration of 1016 cm. The metal work function is 4.5 eV, and the Si electron affinity is 4 eV. Assuming that this M-S junction is at 300K, give your best answers to the following questions. (50 points) (a) At thermal equilibrium, draw the energy band diagram including meaningful parameters (energy barriers, energy levels, depletion width, etc.). (b) Calculate the...
Consider an abrupt p-n junction formed by two steps; an entire silicon sample was first doped...
Consider an abrupt p-n junction formed by two steps; an entire silicon sample was first doped with 1.0E+15 cm-3 acceptors (step I), and then a half of the sample was doped with 2.0E+15 cm-3 donors at room temperature (step II). a. Calculate the Fermi levels on each side of the junction with respect to Ei. Use the Special Conditions to find the concentrations. b. Calculate the contact potential. c. Calculate the ratio , Xpo/Xno
3.13 Si pn junction Consider a long pn junction diode with an acceptor doping Naof 1018...
3.13 Si pn junction Consider a long pn junction diode with an acceptor doping Naof 1018 cm-3 on the p-side and donor concentration of Nj on the n-side. The diode is forward biased and has a voltage of 0.6 V across it. The diode cross-sectional area is 1 mm2. The minority carrier recombination time, T, depends on the total dopant concentration, Ndopant (cm), through the following approximate empirical relation (5x 10-7)/(1 + 2 10-17N1°pan.) where T is in seconds. (a)...
6. (14) A silicon wafer (Si: ni=10cm-3 and Er=11 ) is used to make a PN...
6. (14) A silicon wafer (Si: ni=10cm-3 and Er=11 ) is used to
make a PN junction over a circular area with a diameter r=1mm.
) A silicon wafer (Si: n = 100cm 3 and ε = 11) is used to make a PN junction over a circular area with a diameter r=1 mm. Aluminum is used as a p-type dopant with density of 101cm), and Arsenic as an n-type dopant with density of 10'5cm3. (a) (4) Find the Fermi...
A piece of p-type GaAs is doped with a net impurity concentration of N Na-5 × 1018 m-3. Is it deg...
A piece of p-type GaAs is doped with a net impurity concentration of N Na-5 × 1018 m-3. Is it degenerate or nondegenerate? Find its electron and hole concentrations and its Fermi level at 300 K. How much is the shift of the Fermi level, measured from the intrinsic Fermi level, caused by the doping of the impurity? Compare the results obtained in this problem for the p-type GaAs with those found in Example 12.3 for the n-type GaAs of...
3. Consider a varicap diode made of Si p-n junction is being used in a radio tuning circuit (LC t...
3. Consider a varicap diode made of Si p-n junction is being used in a radio tuning circuit (LC tank) as shown on right. The n-side of the diode has a doping concentration of 2x1016 cm3 and the built-in voltage is 802 mV. Calculate the reverse bias voltage (V) required to tune into the FM station at 106.7 MHz. The junction area is 100 μ㎡ L 220 uH V, Solution We were unable to transcribe this image
3. Consider a...
1. Consider a p-n junction diode with doping concentrations: NA6.5x1015 cm3 and ND 107 cm3 in...
1. Consider a p-n junction diode with doping concentrations: NA6.5x1015 cm3 and ND 107 cm3 in the p- and n-sides, respectively. (a) Calculate the free electron and hole concentrations in both p- and n-sides' neutral regions. (b) Find the barrier height and the built-in voltage. (c) Sketch the energy band diagram of the complete p-n junction. Mark all energy levels including the barrier height and show the energy level values. (d) Calculate the total depletion width under zero bias. (e)...
Wdep P-Type N -Type Q1. Consider the PN junction at equilibrium shown in the figure above....
Wdep P-Type N -Type Q1. Consider the PN junction at equilibrium shown in the figure above. Both N-side and P-side has same doping density NA ND 1017 /cm3. Assume both electron and hole mobility to be same, i.e Me - 1000cm2/Vs. a equilibrium energy band diagram. Find (EF Et at(i)x-0. (ii) x »xn (iii) X <K_Xp Find the value of built-in voltage and total depletion width (5+5 points) Find electron and hole densities at (i) x = 0. (ii) x...
3.13 Si pn junction Consider a long pn junction diode with an acceptor doping Naof 1018 cm-3 on the p-side and donor concentration of Nj on the n-side. The diode is forward biased and has a voltage of 0.6 V across it. The diode cross-sectional area is 1 mm2. The minority carrier recombination time, T, depends on the total dopant concentration, Ndopant (cm), through the following approximate empirical relation (5x 10-7)/(1 + 2 10-17N1°pan.) where T is in seconds. (a)...
An ideal metal-semiconductor (M-S) junction is formed on the n-type Si semiconductor that is uniformly doped with a donor impurity (phosphorus) concentration of 1016 cm. The metal work function is 4.5 eV, and the Si electron affinity is 4 eV. Assuming that this M-S junction is at 300K, give your best answers to the following questions. (50 points) (a) At thermal equilibrium, draw the energy band diagram including meaningful parameters (energy barriers, energy levels, depletion width, etc.). (b) Calculate the...
3.13 Si pn junction Consider a long pn junction diode with an acceptor doping Naof 1018 cm-3 on the p-side and donor concentration of Nj on the n-side. The diode is forward biased and has a voltage of 0.6 V across it. The diode cross-sectional area is 1 mm2. The minority carrier recombination time, T, depends on the total dopant concentration, Ndopant (cm), through the following approximate empirical relation (5x 10-7)/(1 + 2 10-17N1°pan.) where T is in seconds. (a)...
6. (14) A silicon wafer (Si: ni=10cm-3 and Er=11 ) is used to
make a PN junction over a circular area with a diameter r=1mm.
) A silicon wafer (Si: n = 100cm 3 and ε = 11) is used to make a PN junction over a circular area with a diameter r=1 mm. Aluminum is used as a p-type dopant with density of 101cm), and Arsenic as an n-type dopant with density of 10'5cm3. (a) (4) Find the Fermi...
A piece of p-type GaAs is doped with a net impurity concentration of N Na-5 × 1018 m-3. Is it degenerate or nondegenerate? Find its electron and hole concentrations and its Fermi level at 300 K. How much is the shift of the Fermi level, measured from the intrinsic Fermi level, caused by the doping of the impurity? Compare the results obtained in this problem for the p-type GaAs with those found in Example 12.3 for the n-type GaAs of...
3. Consider a varicap diode made of Si p-n junction is being used in a radio tuning circuit (LC tank) as shown on right. The n-side of the diode has a doping concentration of 2x1016 cm3 and the built-in voltage is 802 mV. Calculate the reverse bias voltage (V) required to tune into the FM station at 106.7 MHz. The junction area is 100 μ㎡ L 220 uH V, Solution We were unable to transcribe this image
3. Consider a...
1. Consider a p-n junction diode with doping concentrations: NA6.5x1015 cm3 and ND 107 cm3 in the p- and n-sides, respectively. (a) Calculate the free electron and hole concentrations in both p- and n-sides' neutral regions. (b) Find the barrier height and the built-in voltage. (c) Sketch the energy band diagram of the complete p-n junction. Mark all energy levels including the barrier height and show the energy level values. (d) Calculate the total depletion width under zero bias. (e)...
Wdep P-Type N -Type Q1. Consider the PN junction at equilibrium shown in the figure above. Both N-side and P-side has same doping density NA ND 1017 /cm3. Assume both electron and hole mobility to be same, i.e Me - 1000cm2/Vs. a equilibrium energy band diagram. Find (EF Et at(i)x-0. (ii) x »xn (iii) X <K_Xp Find the value of built-in voltage and total depletion width (5+5 points) Find electron and hole densities at (i) x = 0. (ii) x...
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