A silicon region is doped uniformly with Phosphorous atoms with a doping density of 0.5E 17...
A silicon region is doped uniformly with Phosphorous atoms with a doping density of OSE 17 per cm^3. I want to uniformly dope silicon (300K) such that at equilibrium the hole density is 16-17 per cm3 (a) What dopant atom will you use to achieve this? (b) What will be the doping density of the dopant atom you use!
A silicon crystal is doped with Boron atoms with a dopant density of OSE+17 per cm 3 An electric feld points from left to right. On an average, the free electrons in the silicon block (a) Move from left to right (b) Move from right to left (d) Do not move
1. (25 pts) T=300K. Consider a uniformly doped silicon PN junction with doping concentrations N, = 3x10 cm and Na = 2x10 cm. Calculate Is i LN3x10 cm, Lp = 5x10 cm, and A = 10 cm. If the applied voltage is 0.68 volts, what is the current density?
3. A silicon npn bipolar transistor is uniformly doped and biased in the forward active region with the base-collector junction reverse biased by 2.5 V. The metallurgical base width is 1.5 μm. The emitter, base collector doping concentrations are 5 × 1017, 1016, 2 × 1015 cm-3 respectively. a. At T-300 K, calculate the base-emitter voltage at which the minority carrier electron concentration at x-0 is 20% of the majority carrier hole concentration. At this voltage calculate the minority carrier...
A silicon semiconductor material is doped with 3x1015/cm of phosphorous atoms at room temperature (300°K). Given: Electron mobility is 1450 cm2/V-s, Hole mobility is 380 cm?/V-s, Intrinsic carrier concentration (n) of Si at room temperature (300°K) 1.5x 101%cm³. Calculate the conductivity of the material
A silicon (300 K) block has a Boron dopant density of OSE+17 per cm*3. The thickness of the Silicon region is 1 micro-meter (1E-6 m). (a) Calculate the resistivity (Hint: The thickness does not play any role in determining the resistivity) (b) What should the length and width of the silicon region be if I want to build a resistor with this silicon block that has a resistance of 20 kilo-Ohm. (Hint: There is more than one correct answer for...
3. A silicon step junction has uniform impurity doping concentrations of N. 5 x 1015 cm-3 and Nd = 1 x 1015 cm-, and a cross-sectional area of A-|0-4 cm2. Let tao -0.4 s and tpo 0.1 us. Consider the geometry in Figure.Calculate (a) the ideal reverse saturation current due to holes, (b) the ideal reverse saturation current due to electrons, (c) the hole concentration at a, if V V and (d) the electron current at x = x" +...
Silicon atom density is 5x1022 cm-3, i.e., number of silicon atoms per cubic centimeter of silicon. Use your silicon crystal structure knowledge to prove it.
2. (a) A piece of silicon is doped with 5x107/cm boron atoms. Find the hole and electron concentrations at room temperature (20°C) and at 150°C. (b) Calculate the resistance of the silicon piece in part (a), if it has length of 10 um and cross-section of 10 um'. Use mobility values from the mobility vs carrier concentration plot from lecture slides. (c) Repeat steps (a) and (b) for the Si doped with 104 cm boron atoms. What you mention for...
Please finish these questions. Thank you 1. The surface of a silicon wafer has a region that is uniformly doped with boron at a concentration of 1018cm3. This layer is 20Å thick (1A 104um). The entire wafer, including this region, is uniformly doped with arsenic at a concentration of 1015cm2 The surface of the wafer is sealed and it is heated at 1000° C for 30 min. Assume Do 0.037 cm2/s and EA-3.46eV for Boron in a silicon lattice at...