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5- Determine the equilibrium electron and hole concentrations inside a uniformly...
Assuming complete ionization, determine the equilibrium electron and hole concentrations inside a uniformly doped Si under the following conditions V. Assuming complete ionization, determine the equi...
Assuming complete ionization, determine the equilibrium electron
and hole concentrations inside a uniformly doped Si under the
following conditions
V. Assuming complete ionization, determine the equilibrium electron and hole concentration inside a uniformly doped Si under the following conditions: a) T= 200 K, N,-9 x 1015 /cm, ND-1016 /cm3 b) T= 450 K, N,-0, ND-1014 /cm3
V. Assuming complete ionization, determine the equilibrium electron and hole concentration inside a uniformly doped Si under the following conditions: a) T= 200 K,...
Determine the equilibrium electron and hole concentration inside a uniformly doped sample of Si under the...
Determine the equilibrium electron and hole concentration inside a uniformly doped sample of Si under the following conditions: 4. (a) T 300 K, NA ND, N 1016/cm3 (b) T = 450 K, N,-0, ND-1014/cm 3 (You can use the necessary data from Fig. 2.20 for your calculation.)
2. A GaAs semiconductor at T 300 K is uniformly doped with NA 1016 cm3 and...
2. A GaAs semiconductor at T 300 K is uniformly doped with NA 1016 cm3 and No 0. The GaAs is illuminated with a light source at t = 0 s, resulting in a uniform generation rate of electron hole pairs g' 1020 cm . The electric field is zero. a) Give the analytic expression for the excess-carrier concentration δn(t) versus the time t>0s b) The steady state excess carrier concentration is found to be on( is the minority carrier...
1. a. Find the main error in each of the band diagrams shown below. For all...
1. a. Find the main error in each of the band diagrams shown below. For all of the band diagrams Ny 1019/cm3, Ne- 1019/cm3, ni = 3 x 108/cm". E,-1.25 eV, T = 300 K. Ef Ef EFi Main error: Main error: Main error: Main error: Consider a semiconductor sample with the following characteristics: EG 1.25 eV, T 300 K, Nd 5 x 101*/cm3, Na 1014/cm3, N.-1019/cm3, N.-1019/cm3, ni-3 × 108/cm3. Assume complete ionization b. Find the equilibrium electron and...
3. A silicon step junction has uniform impurity doping concentrations of N. 5 x 1015 cm-3 and Nd ...
3. A silicon step junction has uniform impurity doping concentrations of N. 5 x 1015 cm-3 and Nd = 1 x 1015 cm-, and a cross-sectional area of A-|0-4 cm2. Let tao -0.4 s and tpo 0.1 us. Consider the geometry in Figure.Calculate (a) the ideal reverse saturation current due to holes, (b) the ideal reverse saturation current due to electrons, (c) the hole concentration at a, if V V and (d) the electron current at x = x" +...
3. A silicon npn bipolar transistor is uniformly doped and biased in the forward active region wi...
3. A silicon npn bipolar transistor is uniformly doped and biased in the forward active region with the base-collector junction reverse biased by 2.5 V. The metallurgical base width is 1.5 μm. The emitter, base collector doping concentrations are 5 × 1017, 1016, 2 × 1015 cm-3 respectively. a. At T-300 K, calculate the base-emitter voltage at which the minority carrier electron concentration at x-0 is 20% of the majority carrier hole concentration. At this voltage calculate the minority carrier...
A Si sample is doped with NA = 5 x 1015cm 3 and optical excited uniformly...
A Si sample is doped with NA = 5 x 1015cm 3 and optical excited uniformly with gop-1019EHP/cm3,s. As suming T-300K and using carrier lifetime τη-tp-5us and diffusion coefficient D,-35cm2/s and D,- 12.5cm2Is) (a). Find the steady state electron and hole concentrations (n and p) and the separation of their quasi-Fermi levels (Fn Fp). (b). Calculate the of conductivity, σ, of the Si upon illuminating the light
1. An n-type silicon bar of length L is maintained under steady state conditions such that δpn(0)...
1. An n-type silicon bar of length L is maintained under steady state conditions such that δpn(0)-6pno-1012/cm3 and δpn(L)-0. The Si bar is uniformly doped with N.-1016/cm3 at room temperature. No other photo-generation of processes occurring inside the bar. a) Do low level injection conditions prevail? Explain b) Show the variation of minority carrier concentration with respect to x. c) How much is n(x)? d) What is the position of the quasi-Fermi level inside the bar at (i) x-0, and...
Si sample doped with donors 101°cm-3 initially at room temperature 300 °K (n 31010 cm. Later it i...
Si sample doped with donors 101°cm-3 initially at room temperature 300 °K (n 31010 cm. Later it is excited optically as such 1019 cm-3electron-hole pairs are produced in one second uniformly in the sample. Si band gap energy isEg-1.11 eV and the recombination for hole electron life-time10 μs. Hint may use results of question 1 above. Draw appropriate figures and mark related levels! a) Calculate the equilibrium Fermi level with respect to conduction band edge Ec b) Calculate the equilibrium...
Applied quantum mechanics 1. Calculate the carrier concentrations (p and n) for Si at 300k for...
Applied quantum mechanics
1. Calculate the carrier concentrations (p and n) for Si at
300k for the following doping concentrations:
2.
(a) ND = 1015/cm3
(b) NA = 1018/cm3
(c) ND = 5 x 1017/cm3
Calculate the majority and minority carriers for each side of
an N+P junction if ND = 2 x 1017/cm3 for the n-side, and NA =
1014/cm3 for the p-side.
Assume the semiconductor is Si and the temperature is
300K.
3. Determine the energy of:
(a)...
Assuming complete ionization, determine the equilibrium electron
and hole concentrations inside a uniformly doped Si under the
following conditions
V. Assuming complete ionization, determine the equilibrium electron and hole concentration inside a uniformly doped Si under the following conditions: a) T= 200 K, N,-9 x 1015 /cm, ND-1016 /cm3 b) T= 450 K, N,-0, ND-1014 /cm3
V. Assuming complete ionization, determine the equilibrium electron and hole concentration inside a uniformly doped Si under the following conditions: a) T= 200 K,...
Determine the equilibrium electron and hole concentration inside a uniformly doped sample of Si under the following conditions: 4. (a) T 300 K, NA ND, N 1016/cm3 (b) T = 450 K, N,-0, ND-1014/cm 3 (You can use the necessary data from Fig. 2.20 for your calculation.)
2. A GaAs semiconductor at T 300 K is uniformly doped with NA 1016 cm3 and No 0. The GaAs is illuminated with a light source at t = 0 s, resulting in a uniform generation rate of electron hole pairs g' 1020 cm . The electric field is zero. a) Give the analytic expression for the excess-carrier concentration δn(t) versus the time t>0s b) The steady state excess carrier concentration is found to be on( is the minority carrier...
1. a. Find the main error in each of the band diagrams shown below. For all of the band diagrams Ny 1019/cm3, Ne- 1019/cm3, ni = 3 x 108/cm". E,-1.25 eV, T = 300 K. Ef Ef EFi Main error: Main error: Main error: Main error: Consider a semiconductor sample with the following characteristics: EG 1.25 eV, T 300 K, Nd 5 x 101*/cm3, Na 1014/cm3, N.-1019/cm3, N.-1019/cm3, ni-3 × 108/cm3. Assume complete ionization b. Find the equilibrium electron and...
3. A silicon step junction has uniform impurity doping concentrations of N. 5 x 1015 cm-3 and Nd = 1 x 1015 cm-, and a cross-sectional area of A-|0-4 cm2. Let tao -0.4 s and tpo 0.1 us. Consider the geometry in Figure.Calculate (a) the ideal reverse saturation current due to holes, (b) the ideal reverse saturation current due to electrons, (c) the hole concentration at a, if V V and (d) the electron current at x = x" +...
3. A silicon npn bipolar transistor is uniformly doped and biased in the forward active region with the base-collector junction reverse biased by 2.5 V. The metallurgical base width is 1.5 μm. The emitter, base collector doping concentrations are 5 × 1017, 1016, 2 × 1015 cm-3 respectively. a. At T-300 K, calculate the base-emitter voltage at which the minority carrier electron concentration at x-0 is 20% of the majority carrier hole concentration. At this voltage calculate the minority carrier...
A Si sample is doped with NA = 5 x 1015cm 3 and optical excited uniformly with gop-1019EHP/cm3,s. As suming T-300K and using carrier lifetime τη-tp-5us and diffusion coefficient D,-35cm2/s and D,- 12.5cm2Is) (a). Find the steady state electron and hole concentrations (n and p) and the separation of their quasi-Fermi levels (Fn Fp). (b). Calculate the of conductivity, σ, of the Si upon illuminating the light
1. An n-type silicon bar of length L is maintained under steady state conditions such that δpn(0)-6pno-1012/cm3 and δpn(L)-0. The Si bar is uniformly doped with N.-1016/cm3 at room temperature. No other photo-generation of processes occurring inside the bar. a) Do low level injection conditions prevail? Explain b) Show the variation of minority carrier concentration with respect to x. c) How much is n(x)? d) What is the position of the quasi-Fermi level inside the bar at (i) x-0, and...
Si sample doped with donors 101°cm-3 initially at room temperature 300 °K (n 31010 cm. Later it is excited optically as such 1019 cm-3electron-hole pairs are produced in one second uniformly in the sample. Si band gap energy isEg-1.11 eV and the recombination for hole electron life-time10 μs. Hint may use results of question 1 above. Draw appropriate figures and mark related levels! a) Calculate the equilibrium Fermi level with respect to conduction band edge Ec b) Calculate the equilibrium...
Applied quantum mechanics
1. Calculate the carrier concentrations (p and n) for Si at
300k for the following doping concentrations:
2.
(a) ND = 1015/cm3
(b) NA = 1018/cm3
(c) ND = 5 x 1017/cm3
Calculate the majority and minority carriers for each side of
an N+P junction if ND = 2 x 1017/cm3 for the n-side, and NA =
1014/cm3 for the p-side.
Assume the semiconductor is Si and the temperature is
300K.
3. Determine the energy of:
(a)...
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